WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2015122979) GAS COOLED SUBSTRATE SUPPORT FOR STABILIZED HIGH TEMPERATURE DEPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/122979    International Application No.:    PCT/US2015/011203
Publication Date: 20.08.2015 International Filing Date: 13.01.2015
IPC:
H01L 21/203 (2006.01), H01L 21/683 (2006.01), H01L 21/02 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US)
Inventors: WEST, Brian; (US).
COX, Michael, S.; (US).
OH, Jeonghoon; (US)
Agent: PATTERSON, B., Todd; (US)
Priority Data:
61/940,215 14.02.2014 US
61/943,595 24.02.2014 US
Title (EN) GAS COOLED SUBSTRATE SUPPORT FOR STABILIZED HIGH TEMPERATURE DEPOSITION
(FR) SUPPORT DE SUBSTRAT REFROIDI AU GAZ POUR DÉPÔT À HAUTE TEMPÉRATURE STABILISÉE
Abstract: front page image
(EN)Embodiments of the present disclosure provides apparatus and method for stabilizing substrate temperature by flowing a flow of cooling gas to an inlet of cooling channels in a substrate support, receiving the flow of cooling gas from an outlet of the cooling channel using a heat exchanger, and releasing the cooling gas to an immediate environment, such as a cleanroom or a minienvironment.
(FR)Selon des modes de réalisation, la présente invention concerne un appareil et un procédé permettant de stabiliser la température du substrat en faisant circuler un flux de gaz de refroidissement dans une entrée de canaux de refroidissement dans un support de substrat, à recevoir le flux de gaz de refroidissement d'une sortie du canal de refroidissement au moyen d'un échangeur de chaleur, et à libérer le gaz de refroidissement dans un environnement immédiat, par exemple une salle blanche ou un minienvironnement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)