WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2015122720) METHOD FOR FORMING CONDUCTIVE MESH PATTERN, AND MESH ELECTRODE AND LAMINATE MANUFACTURED THEREBY
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/122720 International Application No.: PCT/KR2015/001487
Publication Date: 20.08.2015 International Filing Date: 13.02.2015
IPC:
G03F 7/26 (2006.01) ,G03F 7/20 (2006.01) ,H01J 1/30 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
1
Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
02
Main electrodes
30
Cold cathodes
Applicants: LG CHEM, LTD.[KR/KR]; 128, Yeoui-daero Yeongdeungpo-gu Seoul 150-721, KR
Inventors: PARK, Jeongho; KR
SHIN, Bu Gon; KR
KIM, Jae Jin; KR
LEE, Jongbyung; KR
JUNG, Jinmi; KR
JEONG, Yujin; KR
Agent: CHUNG, Soon-Sung; KR
Priority Data:
10-2014-001662513.02.2014KR
Title (EN) METHOD FOR FORMING CONDUCTIVE MESH PATTERN, AND MESH ELECTRODE AND LAMINATE MANUFACTURED THEREBY
(FR) PROCÉDÉ DE FORMATION D'UN MOTIF DE MAILLES CONDUCTEUR, ET GRILLE À MAILLES ET STRATIFIÉ FABRIQUÉS SELON CE PROCÉDÉ
(KO) 전도성 메쉬패턴의 제조방법, 이로 제조된 메쉬 전극 및 적층체
Abstract:
(EN) The present invention relates to a method for forming a conductive mesh pattern, and a mesh electrode and a laminate manufactured thereby.
(FR) La présente invention concerne un procédé de formation d'un motif de mailles conducteur, ainsi qu'une grille à mailles et un stratifié fabriqué selon ce procédé.
(KO) 본 발명은 전도성 메쉬패턴의 제조방법, 이로 제조된 메쉬 전극 및 적층체에 관한 것이다.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)