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Machine translation
1. (WO2015122593) CMP PAD CONDITIONER HAVING DOT SECTIONS AND MANUFACTURING METHOD THEREOF
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/122593    International Application No.:    PCT/KR2014/010305
Publication Date: 20.08.2015 International Filing Date: 30.10.2014
IPC:
H01L 21/304 (2006.01)
Applicants: SAESOL DIAMOND IND. CO., LTD. [KR/KR]; Lot 25-1, Block 607, 61, Sinwon-ro 91beon-gil, Danwon-gu Ansan-si, Gyeonggi-do 425-833 (KR)
Inventors: KWON, Wan-Jae; (KR).
KWON, Young-Pil; (KR).
KIM, Tai-Kyung; (KR).
YANG, Jung-Hyun; (KR).
LEE, Sang-Ho; (KR)
Agent: HANYANG PATENT FIRM; (Hanyang building) 12 Nonhyeonro 38-gil, Gangnam-gu Seoul 135-854 (KR)
Priority Data:
10-2014-0016586 13.02.2014 KR
Title (EN) CMP PAD CONDITIONER HAVING DOT SECTIONS AND MANUFACTURING METHOD THEREOF
(FR) CONDITIONNEUR DE PATIN DE POLISSAGE MÉCANO-CHIMIQUE COMPRENANT DES SECTIONS À POINTS ET SON PROCÉDÉ DE FABRICATION
(KO) 도트부를 구비한 CMP 패드 컨디셔너 및 그 제조방법
Abstract: front page image
(EN)The present invention relates to a CMP pad conditioner having dot sections and a manufacturing method thereof and, more specifically, relates to a CMP pad conditioner comprising: a substrate including one or more flat surfaces; one or more dot sections formed on the flat surfaces; and a plurality of abrasive particles formed on the surfaces of the dot sections, wherein the dot sections are constituted by a protruding spherical surface having a predetermined radius of curvature (R), thereby achieving a small amount of pad to be cut per hour and maintaining high surface roughness, and a manufacturing method thereof.
(FR)La présente invention concerne un conditionneur de patin de polissage mécano-chimique comprenant des sections à points et un procédé de fabrication de celui-ci, et concerne plus spécifiquement un conditionneur de patin de polissage mécano-chimique comprenant : un substrat incluant une ou plusieurs surfaces plates ; une ou plusieurs sections à points formées sur les surfaces plates ; et une pluralité de particules abrasives formées sur les surfaces des sections à points. Les sections à points sont constituées d'une surface sphérique saillante ayant un rayon de courbure (R) prédéterminé, ce qui permet d'obtenir une petite quantité de patin à couper par heure et de maintenir une rugosité de surface élevée. L'invention concerne également un procédé de fabrication de celui-ci.
(KO)본 발명은 도트부를 구비한 CMP 패드 컨디셔너 및 그 제조방법에 관한 것으로써, 구체적으로 적어도 하나 이상의 평탄면을 포함하는 기판, 상기 평탄면에 적어도 하나 이상 형성되는 도트부 및 상기 도트부의 표면에 형성된 복수개의 연마입자를 포함하고, 상기 도트부는 소정의 곡률반경(R)을 가지는 구면이 돌출되는 것으로 구성함으로써 시간당 패드의 절삭량이 낮으면서 높은 표면조도를 유지할 수 있는 CMP 패드 컨디셔너 및 그 제조방법에 관한 발명이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)