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1. (WO2015122300) IMAGING ELEMENT, MANUFACTURING DEVICE, AND ELECTRONIC DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/122300 International Application No.: PCT/JP2015/052797
Publication Date: 20.08.2015 International Filing Date: 02.02.2015
IPC:
H01L 27/14 (2006.01) ,G02B 3/00 (2006.01) ,H04N 5/357 (2011.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14
including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3
Simple or compound lenses
H ELECTRICITY
04
ELECTRIC COMMUNICATION TECHNIQUE
N
PICTORIAL COMMUNICATION, e.g. TELEVISION
5
Details of television systems
30
Transforming light or analogous information into electric information
335
using solid-state image sensors [SSIS]
357
Noise processing, e.g. detecting, correcting, reducing or removing noise
Applicants:
ソニー株式会社 SONY CORPORATION [JP/JP]; 東京都港区港南1丁目7番1号 1-7-1, Konan, Minato-ku, Tokyo 1080075, JP
Inventors:
大塚 洋一 OOTSUKA Yoichi; JP
納土 晋一郎 NOUDO Shinichiro; JP
Agent:
西川 孝 NISHIKAWA Takashi; JP
Priority Data:
2014-02507813.02.2014JP
2014-15840204.08.2014JP
Title (EN) IMAGING ELEMENT, MANUFACTURING DEVICE, AND ELECTRONIC DEVICE
(FR) ÉLÉMENT DE FORMATION D'IMAGE, DISPOSITIF DE FABRICATION ET DISPOSITIF ÉLECTRONIQUE
(JA) 撮像素子、製造装置、電子機器
Abstract:
(EN) This technology relates to an imaging element which, even when a pixel size is large, achieves reductions in optical color mixing and flare, a manufacturing device, and an electronic device. An imaging element is provided with a plurality of unit pixels formed in a light receiving region, a light blocking film formed in a boundary portion between the unit pixels, and a microlens formed with respect to each of the unit pixels. The unit pixel is an approximately square lattice one of 1.98 μm or more, and with respect to each of the unit pixels, the microlenses which are each approximately square with each side of less than 1.98 μm and the number of which is the square of a natural number of 2 or more are formed. The light-blocking film is further formed in a boundary portion between the microlenses. This technology is applicable to an imaging device having a large pixel size.
(FR) La présente technologie se rapporte à un élément de formation d'image qui, même lorsque la taille des pixels est importante, permet de réduire le mélange optique des couleurs et les reflets, un dispositif de fabrication et un dispositif électronique. Un élément de formation d'image comprend une pluralité de pixels élémentaires formés dans une région réceptrice de lumière, un film opaque à la lumière formé dans une région frontière entre les pixels élémentaires et une microlentille formée pour chacun des pixels élémentaires. Le pixel élémentaire est un réseau approximativement carré de 1,98 µm ou plus, les microlentilles, qui sont approximativement carrées et ont chacune un côté inférieur à 1,98 µm et dont le nombre est égal au carré d'un entier naturel supérieur ou égal à 2, étant formées pour chacun des pixels élémentaires. Le film opaque à la lumière est en outre formé dans une région frontière entre les microlentilles. La présente technologie peut s'appliquer à un dispositif de formation d'image ayant une taille de pixel importante.
(JA)  本技術は、画素サイズが大きい場合でも、光学混色やフレアを低減させることができるようにする撮像素子、製造装置、電子機器に関する。 受光領域に形成された複数の単位画素と、単位画素同士の境界部分に形成された遮光膜と、単位画素毎に形成されたマイクロレンズとを備え、単位画素は、1.98μm以上の略正方格子であり、マイクロレンズは、単位画素毎に、一辺が1.98μm未満の略正方形で、2以上の自然数の2乗個形成されている。遮光膜は、マイクロレンズ同士の境界部分にも、さらに形成されている。本技術は、画素サイズが大きい撮像装置に適用できる。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)