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Pub. No.:    WO/2015/120025    International Application No.:    PCT/US2015/014425
Publication Date: 13.08.2015 International Filing Date: 04.02.2015
G03F 7/004 (2006.01), H01L 21/027 (2006.01)
Applicants: ORTHOGONAL, INC. [US/US]; 1999 Lake Ave. Rochester, New York 14650 (US)
Inventors: WRIGHT, Charles Warren; (US).
ROBELLO, Douglas Robert; (US).
DEFRANCO, John Andrew; (US).
FREEMAN, Diane Carol; (US).
BYRNE, Frank Xavier; (US)
Agent: BRUESS, Steven C.; (US)
Priority Data:
61/937,122 07.02.2014 US
Abstract: front page image
(EN)A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60 % by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.
(FR)L'invention concerne une composition photosensible qui comprend un photopolymère fluoré réticulable dispersé dans un solvant fluoré tel qu'un hydrofluoroéther. Le photopolymère fluoré réticulable comprend une première unité répétitive - ayant un groupe fluoré mais pas de groupe cinnamate, et une seconde unité répétitive ayant un groupe cinnamate fluoré. Le polymère présente une teneur totale en fluor dans une plage allant de 30 à 60 % en poids. La composition peut être utilisée pour former une barrière à motifs ou des structures diélectriques sur des substrats et des dispositifs tels que des dispositifs électronique organiques.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)