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1. (WO2015119937) HYDROPHILIC ICE PHOBIC SUBSTRATES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/119937    International Application No.:    PCT/US2015/014237
Publication Date: 13.08.2015 International Filing Date: 03.02.2015
IPC:
C09D 171/00 (2006.01), C09D 183/12 (2006.01), C08L 71/00 (2006.01), C08G 65/336 (2006.01), C08G 65/333 (2006.01)
Applicants: E. I. DU PONT DE NEMOURS AND COMPANY [US/US]; Chestnut Run Plaza 974 Centre Road, P. O. Box 2915 Wilmington, Delaware 19805 (US)
Inventors: LIAO, Ken-Hsuan; (US).
ZUDANS, Andrew William; (US)
Agent: MYERS, Brian J.; (US)
Priority Data:
61/936,895 07.02.2014 US
Title (EN) HYDROPHILIC ICE PHOBIC SUBSTRATES
(FR) SUBSTRATS HYDROPHILES GLACIOPHOBES
Abstract: front page image
(EN)The present disclosure relates to a method of producing a substrate that has a low adhesion to ice. The method comprises applying a layer of a polyalkylene glycol onto the surface of a substrate. The polyalkylene glycol has a number average molecular weight in the range of from 150 to 2,500 and is able to provide a substrate that has an average ice adhesion of less than 1.76 kg/cm2 when a shear stress is applied to ice adhered to the applied layer. The disclosure also relates to fihydrophilic ice phobic substrateslms that comprise a layer of the polyalkylene glycol.
(FR)La présente invention concerne un procédé de production d'un substrat sur lequel la glace n'adhère que faiblement. Le procédé comprend l'application d'une couche d'un polyalkylène glycol sur la surface d'un substrat. Le polyalkylène glycol présente une masse moléculaire moyenne en nombre se situant dans un intervalle de 150 à 2 500 et il se révèle capable de donner un substrat présentant une adhérence moyenne de la glace inférieure à 1,76 kg/cm2 lorsque une contrainte de cisaillement est appliquée à de la glace ayant adhéré à la couche appliquée. L'invention concerne également des substrats de type films hydrophiles glaciophobes comprenant une couche de ce polyalkylène glycol.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)