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1. (WO2015119925) NON-AMINE POST-CMP COMPOSITIONS AND METHOD OF USE

Pub. No.:    WO/2015/119925    International Application No.:    PCT/US2015/014203
Publication Date: Fri Aug 14 01:59:59 CEST 2015 International Filing Date: Wed Feb 04 00:59:59 CET 2015
IPC: C11D 7/60
H01L 21/304
Applicants: ENTEGRIS, INC.
Inventors: LIU, Jun
THOMAS, Elizabeth
FRYE, Donald
Title: NON-AMINE POST-CMP COMPOSITIONS AND METHOD OF USE
Abstract:
An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The compositions achieve highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material, copper interconnect material, or cobalt-containing materials.