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Machine translation
1. (WO2015119400) SUBSTRATE TREATMENT APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/119400    International Application No.:    PCT/KR2015/000969
Publication Date: 13.08.2015 International Filing Date: 29.01.2015
IPC:
H01L 21/205 (2006.01), H01L 21/3065 (2006.01)
Applicants: JUSUNG ENGINEERING CO., LTD. [KR/KR]; 240, Opo-ro, Opo-eup Gwangju-si Gyeonggi-do 464-892 (KR)
Inventors: KIM, Kyeong Min; (KR).
LEE, Myung Jin; (KR).
LEE, Yong Hyun; (KR).
CHOI, Jae Wook; (KR)
Agent: PARK, Yong Bok; (KR)
Priority Data:
10-2014-0012399 04.02.2014 KR
Title (EN) SUBSTRATE TREATMENT APPARATUS
(FR) APPAREIL DE TRAITEMENT DE SUBSTRAT
(KO) 기판처리장치
Abstract: front page image
(EN)The present invention relates to a substrate treatment apparatus comprising: a process chamber; a plurality of gas supply pipes for supplying gas or plasma active species to the inside of the process chamber; a remote plasma generation unit connected to one gas supply pipe among the plurality of gas supply pipes; and an opening/closing valve, which is provided to the one gas supply pipe between the remote plasma generating unit and the process chamber, for selectively cutting off the one gas supply pipe.
(FR)La présente invention concerne un appareil de traitement de substrat comprenant : une chambre de traitement ; une pluralité de tuyaux d'alimentation en gaz pour amener du gaz ou des espèces actives de plasma à l'intérieur de la chambre de traitement ; une unité de génération de plasma distant raccordée à un tuyau d'alimentation en gaz parmi la pluralité de tuyaux d'alimentation en gaz ; et une vanne d'ouverture/fermeture, qui est prévue pour ledit tuyau d'alimentation en gaz entre l'unité de génération de plasma distant et la chambre de traitement, pour couper sélectivement ledit tuyau d'alimentation en gaz.
(KO)본 발명은, 공정챔버; 상기 공정챔버 내부로 가스 또는 플라즈마 활성종을 공급하는 복수의 가스공급관; 상기 복수의 가스공급관 중 하나의 가스공급관에 연결되는 원격플라즈마발생부; 상기 하나의 가스공급관에서 상기 원격플라즈마발생부와 상기 공정챔버 사이에는, 상기 하나의 가스공급관을 선택적으로 차단하는 개폐밸브가 구비되는 것을 특징으로 하는 기판처리장치에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)