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1. (WO2015119260) MODIFIED POLYSILAZANE, COATING SOLUTION CONTAINING SAID MODIFIED POLYSILAZANE, AND GAS BARRIER FILM PRODUCED USING SAID COATING SOLUTION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/119260    International Application No.:    PCT/JP2015/053435
Publication Date: 13.08.2015 International Filing Date: 06.02.2015
IPC:
C01B 21/082 (2006.01), B32B 9/00 (2006.01), C08G 77/62 (2006.01), C09D 183/16 (2006.01), H01L 51/50 (2006.01), H05B 33/02 (2006.01), H05B 33/04 (2006.01)
Applicants: KONICA MINOLTA, INC. [JP/JP]; 2-7-2 Marunouchi, Chiyoda-ku, Tokyo 1007015 (JP)
Inventors: ITOH, Hiroaki; (JP)
Agent: HATTA & ASSOCIATES; Dia Palace Nibancho, 11-9, Nibancho, Chiyoda-ku, Tokyo 1020084 (JP)
Priority Data:
2014-022790 07.02.2014 JP
Title (EN) MODIFIED POLYSILAZANE, COATING SOLUTION CONTAINING SAID MODIFIED POLYSILAZANE, AND GAS BARRIER FILM PRODUCED USING SAID COATING SOLUTION
(FR) POLYSILAZANE MODIFIÉ, SOLUTION DE REVÊTEMENT CONTENANT LEDIT POLYSILAZANE MODIFIÉ, ET FILM BARRIÈRE CONTRE LES GAZ OBTENU À L'AIDE DE LADITE SOLUTION DE REVÊTEMENT
(JA) 変性ポリシラザン、当該変性ポリシラザンを含む塗布液および当該塗布液を用いて製造されるガスバリア性フィルム
Abstract: front page image
(EN) The present invention provides a method for producing a gas barrier film having exceptional storage stability, especially storage stability under rigorous conditions (high-temperature, high-humidity conditions). This modified polysilazane has a ratio ((SiH3:(SiH+SiH2)) of SiH3 and the total of SiH and SiH2 of 1:10-30 as measured by 29Si-NMR.
(FR) L'invention concerne un procédé de production d'un film barrière contre les gaz présentant une stabilité d'entreposage exceptionnelle, en particulier une stabilité d'entreposage dans des conditions rigoureuses (conditions de température élevée ou de forte humidité). Ce polysilazane modifié présente un rapport ((SiH3:(SiH+SiH2)) de SiH3 et le total de SiH et SiH2 de 1:10 à 30, tel que mesuré par 29Si-NMR.
(JA) 本発明は、保存安定性、特に過酷な条件(高温高湿条件)下での保存安定性に優れるガスバリア性フィルムの製造方法を提供する。本発明の変性ポリシラザンは、29Si-NMRで測定されるSiHとSiH及びSiHの合計との比[(SiH):(SiH+SiH)]が1:10~30である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)