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1. (WO2015118724) TRANSPARENT CONDUCTIVE LAMINATE, METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE LAMINATE, AND ELECTRONIC DEVICE FORMED USING TRANSPARENT CONDUCTIVE LAMINATE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/118724 International Application No.: PCT/JP2014/077183
Publication Date: 13.08.2015 International Filing Date: 10.10.2014
IPC:
H01B 5/14 (2006.01) ,B32B 9/00 (2006.01) ,C23C 14/08 (2006.01) ,H01B 13/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
5
Non-insulated conductors or conductive bodies characterised by their form
14
comprising conductive layers or films on insulating-supports
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
13
Apparatus or processes specially adapted for manufacturing conductors or cables
Applicants:
リンテック株式会社 LINTEC CORPORATION [JP/JP]; 東京都板橋区本町23番23号 23-23, Honcho, Itabashi-ku, Tokyo 1730001, JP
Inventors:
原 務 HARA Tsutomu; JP
永縄 智史 NAGANAWA Satoshi; JP
永元 公市 NAGAMOTO Koichi; JP
Agent:
江森 健二 EMORI Kenji; JP
Priority Data:
2014-02198107.02.2014JP
Title (EN) TRANSPARENT CONDUCTIVE LAMINATE, METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE LAMINATE, AND ELECTRONIC DEVICE FORMED USING TRANSPARENT CONDUCTIVE LAMINATE
(FR) STRATIFIÉ CONDUCTEUR TRANSPARENT, PROCÉDÉ PERMETTANT DE PRODUIRE UN STRATIFIÉ CONDUCTEUR TRANSPARENT ET DISPOSITIF ÉLECTRONIQUE FORMÉ À L'AIDE D'UN STRATIFIÉ CONDUCTEUR TRANSPARENT
(JA) 透明導電性積層体、透明導電性積層体の製造方法、および透明導電性積層体を用いてなる電子デバイス
Abstract:
(EN) The present invention provides a transparent conductive laminate having excellent moist heat characteristics, a method for producing said transparent conductive laminate, and an electronic device formed using such a transparent conductive laminate. Provided is a transparent conductive laminate formed by forming a transparent conductive layer on at least one side of a substrate, said laminate being characterized in that the transparent conductive layer includes zinc oxide and constitutes a zinc oxide film formed by doping gallium and indium, and the zinc oxide film includes a plurality of regions having non-uniform concentration distributions of zinc content, gallium content, oxygen content, and indium content measured by XPS analysis in the depth direction, said plurality of regions including a first region and a second region having different [In]/[Ga] values.
(FR) La présente invention se rapporte à un stratifié conducteur transparent présentant d'excellentes caractéristiques de chaleur humide, à un procédé permettant de produire ledit stratifié conducteur transparent et à un dispositif électronique formé à l'aide d'un tel stratifié conducteur transparent. L'invention concerne un stratifié conducteur transparent formé par la formation d'une couche conductrice transparente sur au moins un côté d'un substrat, ledit stratifié étant caractérisé en ce que la couche conductrice transparente comprend de l'oxyde de zinc et constitue un film d'oxyde de zinc formé par dopage du gallium et de l'indium et en ce que le film d'oxyde de zinc comprend une pluralité de régions présentant des distributions non uniformes de concentration de la teneur en zinc, de la teneur en gallium, de la teneur en oxygène et de la teneur en indium mesurées par une analyse XPS dans le sens de la profondeur, ladite pluralité de régions comprenant une première région et une seconde région ayant des valeurs [In]/[Ga] différentes.
(JA)  優れた湿熱特性を有する透明導電性積層体、透明導電性積層体の製造方法およびそのような透明導電性積層体を用いてなる電子デバイスを提供する。 基材上の少なくとも片面に透明導電層を形成してなる透明導電性積層体等であって、透明導電層が、酸化亜鉛を含むとともに、ガリウムおよびインジウムをドープしてなる酸化亜鉛膜であり、当該酸化亜鉛膜が、深さ方向のXPS分析によって測定される亜鉛量、ガリウム量、酸素量、およびインジウム量に関して、不均一な濃度分布を有する複数領域を含んでおり、かつ、当該複数領域が、[In]/[Ga]の値が異なる第1領域および第2領域を含むことを特徴とする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)