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1. (WO2015118624) CHARGED PARTICLE BEAM DEVICE, OPTICAL DEVICE, IRRADIATION METHOD, DIFFRACTION GRATING SYSTEM, AND DIFFRACTION GRATING
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/118624 International Application No.: PCT/JP2014/052608
Publication Date: 13.08.2015 International Filing Date: 05.02.2014
IPC:
G21K 1/06 (2006.01) ,G02B 5/18 (2006.01) ,H01J 37/04 (2006.01) ,H01J 37/09 (2006.01) ,H01J 37/26 (2006.01)
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1
Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06
using diffraction, refraction, or reflection, e.g. monochromators
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
18
Diffracting gratings
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
09
Diaphragms; Shields associated with electron- or ion-optical arrangements; Compensation of disturbing fields
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
Applicants:
株式会社日立製作所 HITACHI, LTD. [JP/JP]; 東京都千代田区丸の内一丁目6番6号 6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008280, JP
Inventors:
原田 研 HARADA, Ken; JP
孝橋 照生 KOHASHI, Teruo; JP
岩根 智広 IWANE, Tomohiro; JP
Agent:
井上 学 INOUE, Manabu; 東京都千代田区丸の内一丁目6番1号 株式会社日立製作所内 c/o HITACHI, LTD., 6-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008220, JP
Priority Data:
Title (EN) CHARGED PARTICLE BEAM DEVICE, OPTICAL DEVICE, IRRADIATION METHOD, DIFFRACTION GRATING SYSTEM, AND DIFFRACTION GRATING
(FR) DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES, DISPOSITIF OPTIQUE, PROCÉDÉ D'IRRADIATION, SYSTÈME DE RÉSEAU DE DIFFRACTION ET RÉSEAU DE DIFFRACTION
(JA) 荷電粒子線装置、光学装置、照射方法、回折格子システム、及び回折格子
Abstract:
(EN) Using an aperture instrument that is separate from a diffraction gradient that includes an edge dislocation, the present invention makes the size and external shape of the diffraction grating smaller than the irradiation area of light waves, electron waves, etc. The present invention also superimposes the shape and size of an aperture onto the shape of spiral waves that are generated by the edge dislocation diffraction grating and makes the shape and size of the spiral waves on a diffraction surface reflect the shape and size of the aperture. In addition, the present invention is not a diffraction grating system that uses a single aperture instrument and a single diffraction grating, but is a diffraction grating system that combines a plurality of aperture instruments and a plurality of edge dislocation diffraction gratings and that can generate a plurality of spiral waves on a diffraction surface with a high degree of freedom.
(FR) À l'aide d'un instrument d'ouverture qui est séparé d'un gradient de diffraction qui comprend une dislocation marginale, la présente invention rend la taille et la forme externe du réseau de diffraction inférieures à la zone d'irradiation d'ondes lumineuses, d'ondes électroniques, etc. La présente invention superpose également la forme et la taille d'une ouverture sur la forme d'ondes en spirale qui sont générées par le réseau de diffraction à dislocation marginale et fait que la forme et la taille des ondes en spirale sur une surface de diffraction réfléchissent la forme et la taille de l'ouverture. En outre, la présente invention n'est pas un système de réseau de diffraction qui utilise un seul instrument d'ouverture et un seul réseau de diffraction mais elle est un système de réseau de diffraction qui combine une pluralité d'instruments d'ouverture et une pluralité de réseaux de diffraction à dislocation marginale et qui peut générer une pluralité d'ondes en spirale sur une surface de diffraction avec un degré élevé de liberté.
(JA)  刃状転位を含む回折格子の外形や大きさを、該回折格子とは別なる開口器用いることにより光波や電子波などの照射領域よりも小さくし、刃状転位回折格子が生成するらせん波の形状に開口の形状や大きさを重畳させ、回折面上でのらせん波の形状や大きさを開口の形状や大きさを反映したものとする。また、単一の開口器と単一の回折格子のペアによる回折格子システムだけでなく、複数の開口器と複数の刃状転位回折格子を組み合わせた回折格子システムとし、回折面上で複数のらせん波をより高い自由度で生成可能とする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)