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1. (WO2015116267) SUBSTRATES HAVING AN ANTIREFLECTION LAYER AND METHODS OF FORMING AN ANTIREFLECTION LAYER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/116267    International Application No.:    PCT/US2014/063163
Publication Date: 06.08.2015 International Filing Date: 30.10.2014
IPC:
H01L 31/00 (2006.01)
Applicants: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. [US/US]; 233 Grinter Hall Gainesville, FL 32611 (US)
Inventors: JIANG, Peng; (US).
ASKAR, Khalid; (US).
WANG, Jiamin; (US).
KIM, Christopher; (US)
Agent: LINDER, Christopher, B.; (US)
Priority Data:
61/897,961 31.10.2013 US
Title (EN) SUBSTRATES HAVING AN ANTIREFLECTION LAYER AND METHODS OF FORMING AN ANTIREFLECTION LAYER
(FR) SUBSTRATS COMPORTANT UNE COUCHE ANTIREFLET ET PROCÉDÉS DE FORMATION D'UNE COUCHE ANTIREFLET
Abstract: front page image
(EN)Embodiments of the present disclosure provide for methods of making substrates having an antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like.
(FR)Les modes de réalisation de la présente invention concernent des procédés de fabrication de substrats comportant une couche antireflet, des substrats présentant une couche antireflet, des dispositifs comprenant un substrat comportant une couche anti-reflet, et analogues.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)