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1. (WO2015115420) APPLICATOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/115420    International Application No.:    PCT/JP2015/052176
Publication Date: 06.08.2015 International Filing Date: 27.01.2015
A61M 37/00 (2006.01)
Applicants: HISAMITSU PHARMACEUTICAL CO., INC. [JP/JP]; 408, Tashirodaikan-machi, Tosu-shi, Saga 8410017 (JP)
Inventors: FUDOJI Ryusuke; (JP).
OGURA Makoto; (JP)
Agent: HASEGAWA Yoshiki; (JP)
Priority Data:
2014-014021 29.01.2014 JP
(JA) アプリケータ
Abstract: front page image
(EN) This applicator is provided with a support surface for supporting a sloped micro-needle, and a rotation mechanism for rotating the support surface in the direction of the distal end of the micro-needle along the longitudinal direction in which the micro-needle is to puncture skin, the rotation mechanism being limited in movement range.
(FR) Cet applicateur est muni d'une surface de support pour supporter une micro-aiguille inclinée et d'un mécanisme de rotation pour faire tourner la surface de support en direction de l'extrémité distale de la micro-aiguille le long de la direction longitudinale dans laquelle la micro-aiguille perfore la peau, le mécanisme de rotation étant limité dans la plage de déplacements.
(JA) 一実施形態に係るアプリケータは、傾斜したマイクロニードルを支持する支持面と、マイクロニードルが皮膚に刺さる前後に亘って該マイクロニードルの先端の方向に支持面を回転させ、かつ移動範囲が制限された回転機構とを備える。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)