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1. (WO2015115128) PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING, AND METHOD FOR FORMING ULTRAFINE PATTERN USING THE COMPOSITION

Pub. No.:    WO/2015/115128    International Application No.:    PCT/JP2015/050132
Publication Date: Fri Aug 07 01:59:59 CEST 2015 International Filing Date: Wed Jan 07 00:59:59 CET 2015
IPC: H01L 21/027
Applicants: DAICEL CORPORATION
株式会社ダイセル
Inventors: FUJIKAWA, Takeshi
藤川武
YAMAMOTO, Takuya
山本拓也
Title: PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING, AND METHOD FOR FORMING ULTRAFINE PATTERN USING THE COMPOSITION
Abstract:
Provided is a photocurable composition for nanoimprinting, by which an ultrafine pattern of a mold can be transferred and formed with good precision while maintaining a uniform film thickness with no uneven distribution of a resin even after a uniform coating film is formed on a wafer and then left to stand for a certain period of time. This photocurable composition for nanoimprinting is characterized by containing component (A), component (B), component (C) and component (D), and in that the content of component (C) is 1-30 wt.% relative to the overall quantity (100 wt.%) of the photocurable composition. Component (A): A cation-curable compound represented by formula (1) Component (B): A photo-cation polymerization initiator Component (C): A solvent which contains a hydroxyl group and has a boiling point of 100ºC-210ºC (at 760 mm Hg) Component (D): A solvent which does not contain a hydroxyl group, has a boiling point of 140ºC-210ºC (at 760 mm Hg), and can dissolve a monomer having a solubility parameter of 8.0-10.0 (cal/cm3)1/2.