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Machine translation
1. (WO2015114489) A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID)
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/114489    International Application No.:    PCT/IB2015/050454
Publication Date: 06.08.2015 International Filing Date: 21.01.2015
IPC:
C09G 1/18 (2006.01), C09G 1/02 (2006.01), H01L 21/304 (2006.01)
Applicants: BASF SE [DE/DE]; 67056 Ludwigshafen (DE).
BASF (CHINA) COMPANY LIMITED [CN/CN]; 300 Jiangxinsha Road Shanghai, 200137 (CN) (MN only)
Inventors: LAUTER, Michael; (DE).
LANGE, Roland; (DE).
NOLLER, Bastian Marten; (DE).
SIEBERT, Max; (DE)
Common
Representative:
BASF SE; 67056 Ludwigshafen (DE)
Priority Data:
14153454.5 31.01.2014 EP
Title (EN) A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID)
(FR) COMPOSITION DE POLISSAGE MÉCANO-CHIMIQUE (CMP) CONTENANT UN POLY( ACIDE AMINÉ)
Abstract: front page image
(EN)A chemical mechanical polishing (CMP) composition comprising (A) Colloidal or fumed inorganic particles or a mixture thereof, (B) a poly(amino acid) and or a salt thereof,and (M) an aqueous medium.
(FR)L'invention concerne une composition de polissage mécano-chimique (CMP) comprenant (A) des particules inorganiques colloïdales ou fumées ou un mélange de ces dernières, (B) un poly(acide aminé) et ou un sel de celui-ci, et (M) un milieu aqueux.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)