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1. (WO2015049683) LOW FRICTION FILM AND A METHOD OF PRODUCING THE LOW FRICTION FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/049683    International Application No.:    PCT/IL2014/050861
Publication Date: 09.04.2015 International Filing Date: 01.10.2014
IPC:
C23C 8/62 (2006.01), B05D 5/08 (2006.01), B23P 9/00 (2006.01), C23C 12/02 (2006.01), C23C 24/04 (2006.01), F02F 3/10 (2006.01)
Applicants: TECHNION RESEARCH & DEVELOPMENT FOUNDATION LIMITED [IL/IL]; T3 - Patents, Malat Bldg., Floor 5 Technion City 3200004 Haifa (IL)
Inventors: VARENBERG, Michael; (IL).
RYK, Grigory; (IL)
Priority Data:
228665 01.10.2013 IL
Title (EN) LOW FRICTION FILM AND A METHOD OF PRODUCING THE LOW FRICTION FILM
(FR) FILM À BAS COEFFICIENT DE FROTTEMENT ET SON PROCÉDÉ DE PRODUCTION
Abstract: front page image
(EN)Aspects of the invention are related to an article comprising a low friction film and a method of forming the low friction film on a surface of the article. The low friction film may be formed by applying a mechanical finishing surface treatment to the surface and subjecting the surface to a friction reducing material which diffuses through the surface forming the self-regenerating low friction film. The low friction film comprises at least 1 atomic % of friction reducing material atoms based on the total atoms within the low friction film, such that the low friction film has a residual compressive stress larger than 10 MPa.
(FR)Selon certains aspects, cette invention concerne un article comprenant un film à bas coefficient de frottement et un procédé de formation dudit film à bas coefficient de frottement sur une surface de l'article. Le film à bas coefficient de frottement peut être formé par application d'un traitement de surface de type finition mécanique et soumission de la surface à un matériau réduisant le coefficient de frottement qui se diffuse sur toute la surface pour former un film à bas coefficient de frottement auto-régénérant. Le film à bas coefficient de frottement selon l'invention comprend au moins 1 % atomique d'atomes de matériau réduisant le coefficient de frottement sur la base des atomes totaux contenus dans ledit film à bas coefficient de frottement, de façon que le film à bas coefficient de frottement ait une contrainte de compression résiduaire supérieure à 10 MPa.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)