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1. (WO2015048501) PROCESS, FILM, AND APPARATUS FOR TOP CELL FOR A PV DEVICE

Pub. No.:    WO/2015/048501    International Application No.:    PCT/US2014/057793
Publication Date: Fri Apr 03 01:59:59 CEST 2015 International Filing Date: Sat Sep 27 01:59:59 CEST 2014
IPC: H01L 31/00
Applicants: TEL SOLAR AG
TOKYO ELECTRON U.S. HOLDINGS, INC.
Inventors: SALABAS, Elena Lorena
KUEGLER, Eduard
PRIGENT, Chloe
SALABAS, Aurel
Title: PROCESS, FILM, AND APPARATUS FOR TOP CELL FOR A PV DEVICE
Abstract:
This disclosure describes systems and methods for making at least a portion of a photovoltaic device. This may include a method of manufacturing, an optimization procedure and an apparatus for the PECVD (plasma enhanced chemical vapor deposition) of thin films over large area substrates. In particular, the system may be used to deposit thin film silicon material for photovoltaic (PV) applications. The photovoltaic device may be achieved by a combination of plasma chamber design (e.g., inter-electrode separation) and plasma process parameters (e.g., pressure, applied RF voltage, etc.) to optimize the doped and/or intrinsic layers of the solar cell (e.g., p-i-n junction).