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1. (WO2015046092) LAMINATED FILM, ORGANIC ELECTROLUMINESCENCE DEVICE, PHOTOELECTRIC CONVERSION DEVICE, AND LIQUID CRYSTAL DISPLAY
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/046092 International Application No.: PCT/JP2014/074980
Publication Date: 02.04.2015 International Filing Date: 16.09.2014
IPC:
B32B 7/02 (2006.01) ,B32B 9/00 (2006.01) ,C23C 16/42 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/02 (2006.01) ,H05B 33/04 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
7
Layered products characterised by the relation between layers, i.e. products essentially comprising layers having different physical properties or products characterised by the interconnection of layers
02
in respect of physical properties, e.g. hardness
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42
Silicides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
04
Sealing arrangements
Applicants:
住友化学株式会社 SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 東京都中央区新川二丁目27番1号 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260, JP
Inventors:
長谷川 彰 HASEGAWA, Akira; JP
Agent:
中山 亨 NAKAYAMA, Tohru; JP
Priority Data:
2013-20093727.09.2013JP
2014-17508829.08.2014JP
Title (EN) LAMINATED FILM, ORGANIC ELECTROLUMINESCENCE DEVICE, PHOTOELECTRIC CONVERSION DEVICE, AND LIQUID CRYSTAL DISPLAY
(FR) FILM STRATIFIÉ, DISPOSITIF ÉLECTROLUMINESCENT ORGANIQUE, DISPOSITIF DE CONVERSION PHOTOÉLECTRIQUE ET DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES
(JA) 積層フィルム、有機エレクトロルミネッセンス装置、光電変換装置および液晶ディスプレイ
Abstract:
(EN) A laminated film having a base material and at least one thin film layer formed upon at least one surface of the base material. At least one layer of the thin film layer fulfils the all conditions (i)-(iv): (i) the layer contains silicon, oxygen, and carbon; (ii) the carbon atom content (X (at%)) relative to the total silicon, oxygen, and carbon atom content is 3-25 at%; (iii) the average density (d (g/cm3)) is at least 2.12 g/cm3 and less than 2.25 g/cm3; and (iv) the total carbon atom content (X (at%)) and the average density (d (g/m3)) fulfil the condition indicated by formula (1): d > (2.22-0.008X).
(FR) L'invention porte sur un film stratifié, lequel film a un matériau de base et au moins couche en film mince formée sur au moins une surface du matériau de base. Au moins une couche de la couche en film mince satisfait à toutes les conditions (i) – (iv) : (i) la couche contient du silicium, de l'oxygène et du carbone ; (ii) la teneur en atomes de carbone (X (pourcentage atomique)) par rapport à la teneur en atomes de silicium, d'oxygène et de carbone totale est de 3 à 25 % en pourcentage atomique ; (iii) la densité moyenne (d (g/cm3)) est d'au moins 2,12 g/cm3 et est inférieure à 2,25 g/cm3; et (iv) la teneur totale en atomes de carbone (X (pourcentage atomique)) et la densité moyenne (d (g/m3)) satisfont à la condition indiquée par la formule (1): d > (2,22-0,008X).
(JA)  基材と、前記基材の少なくとも片方の表面上に形成された少なくとも1層の薄膜層とを有する積層フ ィルムであって、 前記薄膜層のうちの少なくとも1層が下記条件(i)~(iv): (i) 珪素、酸素および炭素を含有すること、 (ii) 珪素の原子数、酸素の原子数および炭素の原子数の合計の原子数に対する炭素の原子数の含 有率X(at%)が3~25at%であること、 (iii) 平均密度d(g/cm3)が、2.12g/cm3以上2.25g/cm3未満であること、 (iv) 前記炭素の原子数の含有率X(at%)と、平均密度d(g/cm3)とが、下記式(1): d>(2.22-0.008X)・・・(1) で表される条件を満たすこと、 を全て満たす積層フィルム。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)