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1. (WO2015045511) PATTERN QUALITY MANAGEMENT CHART, PATTERN QUALITY MANAGEMENT METHOD, AND PATTERN FORMATION METHOD

Pub. No.:    WO/2015/045511    International Application No.:    PCT/JP2014/065930
Publication Date: Fri Apr 03 01:59:59 CEST 2015 International Filing Date: Tue Jun 17 01:59:59 CEST 2014
IPC: H01L 21/288
B05C 11/10
H01L 21/28
H05K 3/00
Applicants: FUJIFILM CORPORATION
富士フイルム株式会社
Inventors: TATSUTA Takeichi
龍田 岳一
Title: PATTERN QUALITY MANAGEMENT CHART, PATTERN QUALITY MANAGEMENT METHOD, AND PATTERN FORMATION METHOD
Abstract:
A pattern quality management chart is provided with: a chart-use substrate comprising the same material as a substrate that is patterned by first areas having a predetermined affinity for a functional liquid for patterning, and second areas having an affinity lower than the predetermined affinity; and at least one unit-area group formed upon the surface of the chart-use substrate. The unit-area group includes at least one unit area comprising a first area surrounded therearound by a second area, wherein the unit area has a shape and a size such that: when functional liquid within a predetermined supply amount range is supplied under predetermined supply conditions into the unit area, the functional liquid does not overflow into the surrounding second area, and the entirety of the unit area is filled with the functional liquid; when functional liquid of a supply amount less than the predetermined supply amount range is supplied under the predetermined supply conditions into the unit area, a part of the unit area is not filled with the functional liquid; and when functional liquid of a supply amount greater than the predetermined supply amount range is supplied under the predetermined supply conditions, into the unit area, a portion of the functional liquid overflows into the surrounding second area.