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1. (WO2015045476) ELECTRON MICROSCOPE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/045476 International Application No.: PCT/JP2014/063016
Publication Date: 02.04.2015 International Filing Date: 16.05.2014
IPC:
H01J 37/295 (2006.01) ,G01N 23/04 (2006.01) ,H01J 37/09 (2006.01) ,H01J 37/147 (2006.01) ,H01J 37/153 (2006.01) ,H01J 37/24 (2006.01) ,H01J 37/244 (2006.01) ,H01J 37/26 (2006.01) ,H01J 37/28 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
295
Electron- or ion-diffraction tubes
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
02
by transmitting the radiation through the material
04
and forming a picture
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
09
Diaphragms; Shields associated with electron- or ion-optical arrangements; Compensation of disturbing fields
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147
Arrangements for directing or deflecting the discharge along a desired path
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
153
Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
24
Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
244
Detectors; Associated components or circuits therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
Applicants:
株式会社 日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
松本 弘昭 MATSUMOTO Hiroaki; JP
佐藤 岳志 SATO Takeshi; JP
谷口 佳史 TANIGUCHI Yoshifumi; JP
原田 研 HARADA Ken; JP
Agent:
井上 学 INOUE Manabu; 東京都千代田区丸の内一丁目6番1号 株式会社日立製作所内 c/o HITACHI, LTD., 6-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008220, JP
Priority Data:
2013-20295130.09.2013JP
Title (EN) ELECTRON MICROSCOPE
(FR) MICROSCOPE ÉLECTRONIQUE
(JA) 電子顕微鏡
Abstract:
(EN) The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11,13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.
(FR) La présente invention porte sur un procédé de Foucault sans lentille dans lequel une lentille d’objectif de microscope électronique à transmission (5) est éteinte, un croisement de faisceaux d’électrons (11, 13) est apparié à une ouverture de zone sélectionnée (65), et la distance focale d’une première lentille d’imagerie (61) peut être modifiée pour permettre une commutation entre un mode d’observation d’image d’échantillon et un mode d’observation de motif de diffraction d’échantillon, caractérisé par le fait qu’un déflecteur (81) est disposé dans un étage suivant la première lentille d’imagerie (61), et des conditions pour un système optique d’irradiation (4) peuvent être fixées après que des conditions pour le système optique d’imagerie ont été déterminées. Cela permet à un procédé de Foucault sans lentille d’être mis en œuvre dans un microscope électronique à transmission à utilisation générale commun qui n’est pas équipé de lentille de blindage magnétique, sans charger l’opérateur.
(JA) 本発明は、透過型電子顕微鏡の対物レンズ(5)をオフにし、制限視野絞り(65)に電子線のクロスオーバー(11,13)を一致させ、第1結像レンズ(61)の焦点距離を変化させることにより、試料の像観察モードと試料の回折パターン観察モードとの切り替えを行うレンズレス・フーコー法において、第1結像レンズ(61)の後段に偏向器(81)を配置すること、結像光学系の条件確定後に照射光学系(4)の条件を固定可能とすること、を特徴とする。これにより、磁気シールドレンズを搭載しない通常の汎用型透過型電子顕微鏡においても操作者への負担なく、レンズレス・フーコー法が実施可能となる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)