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1. (WO2015045348) METHOD FOR FORMING A PATTERNED FILM, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT

Pub. No.:    WO/2015/045348    International Application No.:    PCT/JP2014/004839
Publication Date: Fri Apr 03 01:59:59 CEST 2015 International Filing Date: Tue Sep 23 01:59:59 CEST 2014
IPC: H01L 21/027
B29C 59/02
Applicants: CANON KABUSHIKI KAISHA
Inventors: ITO, Toshiki
ISHIDA, Shingo
KAWASAKI, Youji
SAKAI, Keita
Title: METHOD FOR FORMING A PATTERNED FILM, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
Abstract:
A method is provided which allows the alignment marks of a mold and a substrate to be accurately and simply detected, and accordingly provides a method for forming a patterned film with a high throughput, and also provides a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A patterned film is formed by photo-nanoimprinting. In the method, a gas satisfies the following Inequality (1): In the Inequality (1), nR represents the refractive index of a composition not containing a gas at the wavelength of light, nR' represents the refractive index of the photo-curable composition containing the gas at the wavelength of the light, and nM represents the refractive index of a mold at the wavelength of the light.