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1. (WO2015045212) VACUUM PROCESSING APPARATUS, VACUUM PROCESSING METHOD, METHOD FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT, AND APPARATUS FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT

Pub. No.:    WO/2015/045212    International Application No.:    PCT/JP2014/002743
Publication Date: Fri Apr 03 01:59:59 CEST 2015 International Filing Date: Tue May 27 01:59:59 CEST 2014
IPC: H01L 21/365
G11B 5/39
H01L 21/316
H01L 43/08
H01L 43/12
Applicants: CANON ANELVA CORPORATION
キヤノンアネルバ株式会社
Inventors: SHINADA, Masato
品田 正人
HIROMI, Taichi
廣見 太一
Title: VACUUM PROCESSING APPARATUS, VACUUM PROCESSING METHOD, METHOD FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT, AND APPARATUS FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT
Abstract:
This vacuum processing apparatus has: a vacuum container, which has an air releasing unit connected thereto, and which can be depressurized; a substrate holder that is provided with a substrate placing surface for placing a substrate that is disposed in the vacuum container; and a gas introduction unit that is provided with a gas introduction port for introducing a reactive gas into the vacuum container. The gas introduction port is disposed at a position where molecules of the reactive gas discharged into the vacuum container from the gas introduction port are blocked from linearly reaching the substrate placing surface from the gas introduction port, said position being substantially on the center axis of the substrate placing surface, and the reactive gas reaches the substrate placing surface by means of diffusion of a molecular flow.