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1. (WO2015043957) MIRROR BLANK FOR EUV LITHOGRAPHY WITHOUT EXPANSION UNDER EUV RADIATION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/043957 International Application No.: PCT/EP2014/069302
Publication Date: 02.04.2015 International Filing Date: 10.09.2014
IPC:
C03C 3/06 (2006.01) ,C03B 19/14 (2006.01) ,G02B 5/08 (2006.01) ,G03F 7/20 (2006.01)
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3
Glass compositions
04
containing silica
06
with more than 90% silica by weight, e.g. quartz
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
B
MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
19
Other methods of shaping glass
14
by gas-phase reaction processes
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
08
Mirrors
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
HERAEUS QUARZGLAS GMBH & CO. KG [DE/DE]; Quarzstraße 8 63450 Hanau, DE
Inventors:
BECKER, Klaus; DE
THOMAS, Stephan; DE
Priority Data:
10 2013 219 808.630.09.2013DE
Title (EN) MIRROR BLANK FOR EUV LITHOGRAPHY WITHOUT EXPANSION UNDER EUV RADIATION
(FR) POLI-MIROIR POUR LITHOGRAPHIE EUV SANS EXPANSION DUE AU RAYONNEMENT EUV
(DE) SPIEGELBLANK FÜR EUV LITHOGRAPHIE OHNE AUSDEHNUNG UNTER EUV-BESTRAHLUNG
Abstract:
(EN) The present invention relates to a substrate for an EUV mirror which has a zero crossing temperature profile that is different from the statistical distribution. The invention further relates to a method for producing a substrate for an EUV mirror and to the use thereof, the zero crossing temperature profile in the substrate being adapted to the operating temperature of the mirror. The invention also relates to a lithography method using said substrate.
(FR) La présente invention concerne un substrat destiné à un miroir EUV dont la courbe de température de passage par zéro s'écarte de la courbe de distribution statistique. En outre, l'invention concerne un procédé de production d'un substrat destiné à un miroir EUV et son utilisation, la courbe de température de passage par zéro dans le substrat étant ajustée à la température de fonctionnement du miroir, ainsi qu'un procédé de lithographie utilisant un tel substrat.
(DE) Die vorliegende Erfindung betrifft ein Substrat für einen EUV-Spiegel, das einen von der statistischen Verteilung abweichenden Verlauf der Nulldurchgangstemperatur aufweist. Weiterhin betrifft die Erfindung ein Verfahren zur Herstellung eines Substrates für einen EUV-Spiegel und dessen Verwendung, wobei der Verlauf der Nulldurchgangstemperatur im Substrat der Betriebstemperatur des Spiegels angepasst ist sowie ein Lithographieverfahren unter Verwendung eines solchen Substrates.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)