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1. (WO2015043890) SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/043890 International Application No.: PCT/EP2014/068575
Publication Date: 02.04.2015 International Filing Date: 02.09.2014
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 NL-5500 AH Veldhoven, NL
Inventors:
HOUBEN, Martijn; NL
DE KOCK, Alwin; NL
VAN ABEELEN, Hendrikus, Johannes, Marinus; NL
VAN DEN HEUVEL, Marco, Adrianus, Peter; NL
Agent:
DUNG, Shiang-Lung; NL
Priority Data:
61/883,77527.09.2013US
61/912,38305.12.2013US
Title (EN) SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) TABLE DE SUPPORT POUR APPAREIL LITHOGRAPHIQUE, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Abstract:
(EN) A support table (WT) to support a surface of a substrate (W), wherein the support table comprises: a base surface (22) substantially parallel to the surface of the substrate, a plurality of burls (20) protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions (45) separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions (45) are arranged such that a plurality of the gaps are aligned to form a straight gas flow path (82) towards an edge of the base surface.
(FR) L'invention concerne une table de support (WT) destinée à soutenir une surface d'un substrat (W), ladite table de support comportant : une surface de base (22) sensiblement parallèle à la surface du substrat, une pluralité de bourrelets (20) faisant saillie au-dessus de la surface de base, chacun des bourrelets ayant une extrémité distale respective et une première hauteur au dessus de la surface de base, les bourrelets étant agencés de sorte que, quand le substrat est soutenu par la table de support, le substrat est soutenu par les extrémités distales respectives, et une pluralité de protubérances surélevées et allongées (45) séparées par des espaces, chacune des protubérances surélevées et allongées ayant une seconde hauteur au-dessus de la surface de base, les protubérances surélevées et allongées faisant saillie au-dessus de la surface de base entre les bourrelets, et la seconde hauteur étant inférieure à la première hauteur ; les protubérances (45) étant agencées de sorte que plusieurs espaces sont alignés pour former un chemin d'écoulement de gaz droit (82) vers un bord de la surface de base.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)