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1. (WO2015043833) OPTICAL ASSEMBLY, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEM

Pub. No.:    WO/2015/043833    International Application No.:    PCT/EP2014/067540
Publication Date: Fri Apr 03 01:59:59 CEST 2015 International Filing Date: Tue Aug 19 01:59:59 CEST 2014
IPC: G03F 7/20
B08B 7/00
B24C 1/00
B24C 7/00
B24C 11/00
C01B 31/22
G01N 21/88
G21K 1/06
H01J 65/04
H05G 2/00
G02B 27/00
G01N 21/94
Applicants: CARL ZEISS SMT GMBH
Inventors: BECKER, Moritz
MÜLLER, Ulrich
ARP, Oliver
Title: OPTICAL ASSEMBLY, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEM
Abstract:
The invention relates to an optical assembly, in particular a plasma light source (1') or an EUV lithography system, comprising a housing (2), which encloses a housing interior (3), a vacuum-generating unit for generating a vacuum in the housing (2), at least one surface (13) arranged in the housing interior (3), a cleaning device (15) for removing contaminating substances (14) deposited on the surface (13), and an observation device (25) for observing the surface (13), wherein the observation device (25) has an observation optical unit (26) that can be oriented toward the surface (13). The cleaning device (15) is designed to remove the deposited contaminating substances (14) by discharging CO2 in the form of CO2 pellets (17).