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|1. (WO2015043833) OPTICAL ASSEMBLY, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEM|
|Applicants:||CARL ZEISS SMT GMBH
|Title:||OPTICAL ASSEMBLY, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEM|
The invention relates to an optical assembly, in particular a plasma light source (1') or an EUV lithography system, comprising a housing (2), which encloses a housing interior (3), a vacuum-generating unit for generating a vacuum in the housing (2), at least one surface (13) arranged in the housing interior (3), a cleaning device (15) for removing contaminating substances (14) deposited on the surface (13), and an observation device (25) for observing the surface (13), wherein the observation device (25) has an observation optical unit (26) that can be oriented toward the surface (13). The cleaning device (15) is designed to remove the deposited contaminating substances (14) by discharging CO2 in the form of CO2 pellets (17).