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1. (WO2015043622) METHOD FOR CONTROLLING A GAS SUPPLY AND CONTROLLER
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/043622 International Application No.: PCT/EP2013/069857
Publication Date: 02.04.2015 International Filing Date: 24.09.2013
IPC:
H01J 37/32 (2006.01) ,C23C 16/455 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Applicants:
SCHNAPPENBERGER, Frank [DE/DE]; DE (US)
HELLMICH, Anke [DE/DE]; DE (US)
KOCH, Thomas [DE/DE]; DE (US)
DEPPISCH, Thomas [DE/DE]; DE (US)
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IS, IT, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW)
Inventors:
SCHNAPPENBERGER, Frank; DE
HELLMICH, Anke; DE
KOCH, Thomas; DE
DEPPISCH, Thomas; DE
Agent:
ZIMMERMANN & PARTNER; Josephspitalstr. 15 80331 München, DE
Priority Data:
Title (EN) METHOD FOR CONTROLLING A GAS SUPPLY AND CONTROLLER
(FR) MÉTHODE DE RÉGULATION DE L'ALIMENTATION EN GAZ ET RÉGULATEUR
Abstract:
(EN) A method (200) for controlling a gas supply to a process chamber (301) is provided. The method (200) includes: measuring (210) a gas parameter by each of two or more sensors (35, 36, 313, 314) provided in the process chamber (301); determining (220) a combined gas parameter from the measured gas parameters; and controlling (230) the gas supply to the process chamber (301) based on the determined combined gas parameter.
(FR) Une méthode (200) de régulation d'une alimentation en gaz d'une chambre de traitement (301) est divulguée. Ladite méthode (200) comprend les étapes consistant à : mesurer (210) un paramètre de gaz au moyen de deux capteurs ou plus (35, 36, 313, 314) prévus dans la chambre de traitement (301); déterminer (220) un paramètre de gaz combiné à partir de la mesure des paramètres de gaz; et réguler (230) l'alimentation en gaz de la chambre de traitement (301) en fonction du paramètre de gaz combiné déterminé.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)