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1. (WO2015041301) GLASS SUBSTRATE FOR MAGNETIC DISK, METHOD OF PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK, AND MAGNETIC DISK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/041301    International Application No.:    PCT/JP2014/074734
Publication Date: 26.03.2015 International Filing Date: 18.09.2014
IPC:
G11B 5/73 (2006.01), C03C 3/078 (2006.01), C03C 3/087 (2006.01), C03C 21/00 (2006.01), G11B 5/84 (2006.01)
Applicants: HOYA CORPORATION [JP/JP]; 7-5, Naka-Ochiai 2-Chome, Shinjuku-ku, Tokyo 1618525 (JP)
Inventors: IWATA, Katsuyuki; (JP).
HASHIMOTO, Kazuaki; (JP)
Agent: GLOBAL IP TOKYO; CARMEL II, 8-3-30, Nishi-Shinjuku, Shinjuku-ku, Tokyo 1600023 (JP)
Priority Data:
2013-193476 18.09.2013 JP
Title (EN) GLASS SUBSTRATE FOR MAGNETIC DISK, METHOD OF PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK, AND MAGNETIC DISK
(FR) SUBSTRAT DE VERRE POUR DISQUE MAGNÉTIQUE, PROCÉDÉ DE PRODUCTION DE SUBSTRAT DE VERRE POUR DISQUE MAGNÉTIQUE ET DISQUE MAGNÉTIQUE
(JA) 磁気ディスク用ガラス基板、磁気ディスク用ガラス基板の製造方法、及び磁気ディスク
Abstract: front page image
(EN)In the present invention, a glass substrate for a magnetic disk contains, as the glass composition, 0.1-1 mol% of Li2O. A fracture toughness value KIC[Mpa•m½] of the glass substrate is at least 1[Mpa•m½]. A compressive stress layer formed by chemical strengthening is provided on the glass substrate surface, and the depth D[μm] of the compressive stress layer satisfies D≥57•KIC-1.6 and D≥20[μm]. The glass substrate is obtained by adjusting the chemical strengthening conditions.
(FR)Selon la présente invention, un substrat de verre pour un disque magnétique comporte, comme composition de verre, 0,1-1 mol% de Li2O. La valeur de ténacité à la rupture KIC[Mpa•m½] du substrat de verre est au moins égal à 1[Mpa•m½]. Une couche de contrainte à la compression formée par renforcement chimique est pourvue sur la surface de substrat de verre, et la profondeur D[μm] de la couche de contrainte à la compression vérifie D≥57•KIC -1.6 et D≥20[μm]. Le substrat de verre est obtenu en réglant les conditions de renforcement chimique.
(JA) 磁気ディスク用ガラス基板は、ガラス組成として、モル%表示でLiOを0.1~1%含有する。このガラス基板の破壊靱性値KIC[MPa・m1/2]が1[MPa・m1/2]以上である。ガラス基板表面には化学強化による圧縮応力層が設けられ、前記圧縮応力層の深さD[μm]がD≧57・KIC-1.6、かつD≧20[μm]を満足する。このガラス基板は、化学強化処理の条件を調整することにより得られる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)