WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2015040828) COMPUTED TOMOGRAPHIC MAMMOGRAPHY SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/040828    International Application No.:    PCT/JP2014/004658
Publication Date: 26.03.2015 International Filing Date: 10.09.2014
IPC:
A61B 6/03 (2006.01), A61B 6/00 (2006.01), H01J 35/08 (2006.01)
Applicants: CANON KABUSHIKI KAISHA [JP/JP]; 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)
Inventors: TAMURA, Miki; (JP).
TSUKAMOTO, Takeo; (JP)
Agent: ABE, Takuma; (JP)
Priority Data:
2013-193906 19.09.2013 JP
Title (EN) COMPUTED TOMOGRAPHIC MAMMOGRAPHY SYSTEM
(FR) SYSTÈME DE MAMMOGRAPHIE TOMOGRAPHIQUE INFORMATISÉ
Abstract: front page image
(EN)A computed tomographic mammography system is provided with, as an X-ray tube 1A, a transmission type X-ray tube including a target 2 which includes a target layer 2a that generates X-ray upon irradiation of an electron beam and a supporting substrate 2b through which the X-ray generated upon irradiation of the electron beam to the target layer 2a passes, an electron emission source 3 for emitting an electron beam toward the target layer 2a.
(FR)L'invention concerne un système de mammographie tomographique informatisé avec, comme tube à rayons X 1A, un tube à rayons X du type à transmission comportant une cible 2 qui inclut une couche cible 2a qui génère des rayons X lors de l'irradiation d'un faisceau d'électrons et un substrat support 2b par lequel les rayons X générés lors de l'irradiation du faisceau d'électrons sur la couche cible 2a passent, et une source d'électrons 3 pour émettre un faisceau d'électrons vers la couche cible 2a.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)