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Machine translation
1. (WO2015037478) SUPPORTING GLASS SUBSTRATE AND CONVEYANCE ELEMENT USING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/037478    International Application No.:    PCT/JP2014/073085
Publication Date: 19.03.2015 International Filing Date: 02.09.2014
IPC:
C03C 3/091 (2006.01), C03C 3/093 (2006.01), H01L 21/02 (2006.01), H01L 21/304 (2006.01), H01L 21/677 (2006.01), H01L 21/683 (2006.01)
Applicants: NIPPON ELECTRIC GLASS CO., LTD. [JP/JP]; 7-1, Seiran 2-chome, Otsu-shi, Shiga 5208639 (JP)
Inventors: MIWA Shinkichi; (JP).
IKEDA Hikaru; (JP)
Agent: SHIROMURA Kunihiko; (JP)
Priority Data:
2013-189065 12.09.2013 JP
Title (EN) SUPPORTING GLASS SUBSTRATE AND CONVEYANCE ELEMENT USING SAME
(FR) SUBSTRAT DE SUPPORT EN VERRE ET ÉLÉMENT DE TRANSPORT L'UTILISANT
(JA) 支持ガラス基板及びこれを用いた搬送体
Abstract: front page image
(EN) A supporting glass substrate for supporting a substrate to be processed, the supporting glass substrate not readily causing dimensional variation in the substrate to be processed, the supporting glass substrate characterized by having an average linear thermal expansion coefficient of 50×10-7/˚C to 66×10-7/˚C in a temperature range of 20 to 200°C.
(FR) Substrat de support en verre servant à supporter un substrat à traiter, ledit substrat de support en verre ne provoquant pas facilement une variation dimensionnelle du substrat à traiter et étant caractérisé par le fait qu'il possède un coefficient de dilatation thermique linéaire moyen de 50 × 10-7/˚C à 66×10-7/˚C dans une plage de températures de 20 à 200° C
(JA) 加工基板を支持し且つ加工基板の寸法変化を生じさせ難い支持ガラス基板であって、20~200℃の温度範囲における平均線熱膨張係数が50×10-7/℃以上で且つ66×10-7/℃以下であることを特徴とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)