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Machine translation
1. (WO2015034145) DEVICE AND METHOD FOR GENERATING IDENTIFICATION KEY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/034145    International Application No.:    PCT/KR2014/001248
Publication Date: 12.03.2015 International Filing Date: 17.02.2014
IPC:
G06F 21/70 (2013.01), G06F 21/73 (2013.01)
Applicants: ICTK CO., LTD. [KR/KR]; (Twosoneventureforum Building, Sampyeong-dong) 3F., 323 Pangyo-ro Bundang-gu, Seongnam-si Gyeonggi-do 463-400 (KR)
Inventors: CHOI, Byong Deok; (KR).
KIM, Dong Kyue; (KR)
Agent: MUHANN PATENT & LAW FIRM; (Myeonglim Building, Nonhyeon-dong) 2th Floor, 9 Hakdong-ro 3-gil Gangnam-gu Seoul 135-814 (KR)
Priority Data:
10-2013-0107217 06.09.2013 KR
Title (EN) DEVICE AND METHOD FOR GENERATING IDENTIFICATION KEY
(FR) DISPOSITIF ET PROCÉDÉ DE GÉNÉRATION DE CLÉ D'IDENTIFICATION
(KO) 식별키 생성 장치 및 방법
Abstract: front page image
(EN)Provided is a device for generating an identification key using process variation during the manufacturing process of a conductive layer. The device for generating an identification key comprises: a plurality of conductive layers designed so as to be formed in a first region within a semiconductor chip, the density in which the plurality of conductive layers are disposed in the first region being at least a first threshold value and not more than a second threshold value, the first and second threshold values being less than a minimum density according to the design rules for ensuring that all of the plurality of conductive layers are formed in the first region; and a reading unit which provides an identification key by identifying if, among the plurality of conductive layers, a previously designated first conductive layer has been formed.
(FR)La présente invention concerne un dispositif permettant de générer une clé d'identification à l'aide d'une variation de processus lors du processus de fabrication d'une couche conductrice. Le dispositif permettant de générer une clé d'identification comprend : une pluralité de couches conductrices conçues de sorte à être formées dans une première région à l'intérieur d'une puce à semi-conducteur, la densité dans laquelle la pluralité de couches conductrices est disposée dans la première région étant supérieure ou égale à une première valeur seuil et inférieure ou égale à une seconde valeur seuil, les première et seconde valeurs seuil étant inférieures à une densité minimale conformément aux règles de conception en vue de garantir que l'ensemble des couches parmi la pluralité de couches conductrices est formé dans la première région ; et une unité de lecture qui fournit une clé d'identification en identifiant si, parmi la pluralité de couches conductrices, une première couche conductrice précédemment désignée a été formée.
(KO)전도성 레이어의 제조 공정 상의 공정 편차를 이용하여 식별키를 생성하는 장치가 제공된다. 상기 식별키 생성 장치는, 반도체 칩 내의 제1 영역에 생성되도록 디자인 된 복수 개의 전도성 레이어 - 상기 제1 영역에 상기 복수 개의 전도성 레이어가 배치되는 밀도는 제1 임계값 이상 및 제2 임계값 이하이고, 상기 제1 임계값 및 상기 제2 임계값은 상기 제1 영역에 상기 복수 개의 전도성 레이어의 전부가 생성되는 것을 보장하는 디자인 룰 상의 최소 밀도 미만의 값임 -, 및 상기 복수 개의 전도성 레이어 중 미리 지정되는 제1 전도성 레이어가 생성되었는지의 여부를 식별하여 식별 키를 제공하는 독출부를 포함할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)