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1. (WO2015034084) FRAGRANCE COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/034084    International Application No.:    PCT/JP2014/073670
Publication Date: 12.03.2015 International Filing Date: 08.09.2014
IPC:
C07C 49/11 (2006.01), A61K 8/35 (2006.01), A61Q 13/00 (2006.01), C11B 9/00 (2006.01)
Applicants: TAKASAGO INTERNATIONAL CORPORATION [JP/JP]; 37-1, Kamata 5-chome, Ota-ku, Tokyo 1448721 (JP)
Inventors: HOJO Kazuma; (JP)
Agent: TSUJII Koichi; (JP)
Priority Data:
2013-185114 06.09.2013 JP
Title (EN) FRAGRANCE COMPOSITION
(FR) COMPOSITION DE PARFUM
(JA) 香料組成物
Abstract: front page image
(EN)Provided is a compound represented by general formula (A). (In formula (A), position 1' is optically active, and one of R1 and R2 represents a methyl group and the other represents an ethyl group, or R1 and R2 both represent a methyl group.)
(FR)L'invention concerne un composé représenté par la formule générale (A). (Dans la formule (A), la position 1' est optiquement active, et l'un de R1 et R2 représente un groupe méthyle et l'autre représente un groupe éthyle, ou R1 et R2 représentent tous les deux un groupe méthyle.)
(JA) 本発明は下記一般式(A)で表される化合物を提供する。(式(A)中、1'位は光学活性であり、R1及びR2は、一方がメチル基を表し、他方はエチル基を表すか、又はR1とR2が共にメチル基を表す。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)