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Machine translation
1. (WO2015033442) SUBSTRATE TRANSFER SYSTEM AND SUBSTRATE TRANSFER METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/033442 International Application No.: PCT/JP2013/074113
Publication Date: 12.03.2015 International Filing Date: 06.09.2013
IPC:
B65G 49/06 (2006.01) ,H01L 21/677 (2006.01)
Applicants: SHIMADZU CORPORATION[JP/JP]; 1, Nishinokyo-kuwabaracho, Nakagyo-ku, Kyoto-shi, Kyoto 6048511, JP
Inventors: HIGASHI, Masahisa; JP
TAKEDA, Naoya; JP
Agent: MIYOSHI, Hidekazu; Toranomon Kotohira Tower, 2-8, Toranomon 1-chome, Minato-ku, Tokyo 1050001, JP
Priority Data:
Title (EN) SUBSTRATE TRANSFER SYSTEM AND SUBSTRATE TRANSFER METHOD
(FR) SYSTÈME ET PROCÉDÉ DE TRANSFERT DE SUBSTRATS
(JA) 基板移載システム及び基板移載方法
Abstract: front page image
(EN) The present invention is provided with: a sample holder having a substrate plate at a primary surface of which a substrate mounting region at which a substrate is to be mounted has been defined; a substrate moving device that has a substrate holding pad for holding a substrate by means of vacuum suction and that moves a substrate that is in the state of being held by the substrate holding pad; and a first gas jetting device that jets a first delamination gas at the boundary between the substrate mounting region and the substrate mounted to the substrate mounting region in the state of being held by the substrate holding pad during recovery of the substrate from the sample holder.
(FR) La présente invention comporte: un porte-échantillon doté d'une plaque à substrat sur une surface principale de laquelle a été définie une région de montage de substrat au niveau de laquelle un substrat est appelé à être monté; un dispositif de déplacement de substrats qui est doté d'un patin de maintien de substrats servant à maintenir un substrat par aspiration au vide et qui déplace un substrat en état de maintien par le patin de maintien de substrats; et un dispositif de projection de premier gaz qui projette un premier gaz de décollement à la frontière entre la région de montage de substrat et le substrat monté sur la région de montage de substrat en état de maintien par le patin de maintien de substrats pendant la récupération du substrat à partir du porte-échantillon.
(JA)  主面に基板が搭載される基板搭載領域が定義された基板プレートを有するサンプルホルダと、真空吸着によって基板を保持する基板保持パッドを有し、基板保持パッドに保持した状態で基板を移動させる基板移動装置と、サンプルホルダからの基板の回収時に、基板保持パッドに保持された状態で基板搭載領域に搭載された基板と基板搭載領域との境界に第1の剥離用気体を噴射する第1の気体噴射装置とを備える。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)