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1. (WO2015031620) COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/031620    International Application No.:    PCT/US2014/053172
Publication Date: 05.03.2015 International Filing Date: 28.08.2014
IPC:
C09K 13/00 (2006.01), H01L 21/306 (2006.01)
Applicants: ADVANCED TECHNOLOGY MATERIALS, INC. [US/US]; 7 Commerce Drive Danbury, CT 06810 (US).
ATMI TAIWAN CO., LTD.; 4F-7, No. 81, Shui-lee Rd. Hsin-chu, 300 (TW)
Inventors: COOPER, Emanuel, I.; (US).
CHEN, Li-Min; (US).
LIPPY, Steven; (US).
HSU, Chia-Jung; (TW).
TU, Sheng-hung; (TW).
WANG, Chieh Ju; (TW)
Agent: FUIERER, Tristan; (US)
Priority Data:
61/872,297 30.08.2013 US
Title (EN) COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE
(FR) COMPOSITIONS ET PROCÉDÉS POUR EFFECTUER LA GRAVURE SÉLECTIVE DU NITRURE DE TITANE
Abstract: front page image
(EN)Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant, one etchant, and one activator to enhance the etch rate of titanium nitride.
(FR)L'invention concerne des compositions utiles pour l'élimination sélective du nitrure de titane et/ou des matières de résidu de gravure de résine photosensible relatifs à des matériaux conducteurs métalliques d'un dispositif microélectronique sur lequel ils se trouvent. Les compositions d'élimination contiennent au moins un oxydant, un agent de gravure, et un activateur pour améliorer la vitesse de gravure du nitrure de titane.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)