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1. (WO2015030849) HIGH-AFFINITY BINDING TO GAS6
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/030849    International Application No.:    PCT/US2013/074796
Publication Date: 05.03.2015 International Filing Date: 12.12.2013
IPC:
G01N 33/53 (2006.01), G01N 33/00 (2006.01), C07K 1/00 (2006.01)
Applicants: THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY [US/US]; 1705 El Camino Real Palo Alto, California 94306-1106 (US)
Inventors: COCHRAN, Jennifer R.; (US).
GIACCIA, Amato J.; (US).
MIAO, Yu; (US).
KARIOLIS, Mihalis; (US).
KAPUR, Shiven; (US).
MATHEWS, Irimpan I.; (US)
Agent: SHERWOOD, Pamela J.; Bozicevic, Field & Francis LLP 1900 University Avenue, Suite 200 East Palo Alto, California 94303 (US)
Priority Data:
61/872,602 30.08.2013 US
Title (EN) HIGH-AFFINITY BINDING TO GAS6
(FR) LIAISON À HAUTE AFFINITÉ À GAS6
Abstract: front page image
(EN)Compositions and methods are provided for measuring the amount of GAS6 in a sample. Also provided are compositions and methods related to high-affinity CAS6 inhibitor agents that induce a conformational change of GAS6 that stabilizes Helix A of GAS6.
(FR)L'invention concerne des compositions pour mesurer la quantité GAS6 dans un échantillon. L'invention concerne également des compositions et des méthodes liées à des agents inhibiteurs de CAS6 à haute affinité qui induisent une modification conformationnelle de GAS6 qui stabilise l'hélice A de GAS6.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)