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1. (WO2015030531) POROUS SILICON BASED PARTICLES, METHOD FOR PREPARING SAME AND ANODE ACTIVE MATERIAL COMPRISING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/030531    International Application No.:    PCT/KR2014/008093
Publication Date: 05.03.2015 International Filing Date: 29.08.2014
IPC:
C01B 33/113 (2006.01), C01B 33/02 (2006.01), H01M 4/38 (2006.01), H01M 4/48 (2010.01), H01M 10/052 (2010.01)
Applicants: LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu, Seoul 150-721 (KR).
SJ MATERIALS CO., LTD. [KR/KR]; 108, Modulehwa saneop-ro, Buk-gu Ulsan 683-360 (KR)
Inventors: YOO, Jung Woo; (KR).
LEE, Mi Rim; (KR).
LEE, Yong Ju; (KR).
KIM, Eun Kyung; (KR).
LEE, Han Ho; (KR).
YOON, Ji Hyun; (KR).
BANG, Byoung Man; (KR).
LEE, Chang Rae; (KR).
JEONG, Il Kyo; (KR).
LEE, Mi Kyeong; (KR)
Agent: BAE, KIM & LEE IP GROUP; 11th Floor, 343, Gangnam-daero, Seocho-gu, Seoul 137-858 (KR)
Priority Data:
10-2013-0104877 02.09.2013 KR
10-2014-0112617 27.08.2014 KR
Title (EN) POROUS SILICON BASED PARTICLES, METHOD FOR PREPARING SAME AND ANODE ACTIVE MATERIAL COMPRISING SAME
(FR) PARTICULES À BASE DE SILICIUM POREUX, LEUR PROCÉDÉ DE PRÉPARATION ET SUBSTANCE ACTIVE D'ANODE LES COMPRENANT
(KO) 다공성 실리콘계 입자, 이의 제조 방법, 및 이를 포함하는 음극 활물질
Abstract: front page image
(EN)The present invention provides porous silicon based particles and a method for preparing the same, the porous silicon based particles characterized by comprising Si or SiOx(0x(0
(FR)La présente invention concerne des particules à base de silicium poreux et leur procédé de préparation, les particules à base de silicium poreux étant caractérisées en ce qu'elles comprennent des particules de Si ou de SiOx (0x (0
(KO)본 발명은 Si 또는 SiOx(0x(0
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)