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1. WO2015024956 - DRYING DEVICE FOR USE IN A LITHOGRAPHY SYSTEM

Publication Number WO/2015/024956
Publication Date 26.02.2015
International Application No. PCT/EP2014/067714
International Filing Date 20.08.2014
IPC
H01L 21/67 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
CPC
F26B 21/004
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
26DRYING
BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
21Arrangements ; or duct systems, e.g. in combination with pallet boxes,; for supplying and controlling air or gases for drying solid materials or objects
004Nozzle assemblies; Air knives; Air distributors; Blow boxes
H01J 2237/0437
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
043Beam blanking
0435Multi-aperture
0437Semiconductor substrate
H01J 37/20
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/3177
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
3174Particle-beam lithography, e.g. electron beam lithography
3177Multi-beam, e.g. fly's eye, comb probe
H01L 21/67034
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67028for cleaning followed by drying, rinsing, stripping, blasting or the like
67034for drying
Applicants
  • MAPPER LITHOGRAPHY IP B.V. [NL]/[NL]
Inventors
  • DE JONG, Hendrik Jan
Priority Data
61/869,09323.08.2013US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) DRYING DEVICE FOR USE IN A LITHOGRAPHY SYSTEM
(FR) DISPOSITIF DE SÉCHAGE DESTINÉ À ÊTRE UTILISÉ DANS UN SYSTÈME DE LITHOGRAPHIE
Abstract
(EN)
The invention relates to a drying apparatus for use in a lithography system for drying a planar object such as a wafer, the apparatus comprising a drying device for eliminating liquid or droplets thereof from a planar target such as a wafer, wherein said device comprises a first slit and a second slit arranged in close proximity of the target, a gap being present between the target and the dryer, the first slit included for supplying pressurised gas into said gap directed to the target, the second slit included for discharging said liquid by means of said gas away from the target.
(FR)
L'invention porte sur un appareil de séchage destiné à être utilisé dans un système de lithographie pour sécher un objet plan tel qu'une plaquette, l'appareil comprenant un dispositif de séchage pour éliminer du liquide, ou des gouttelettes de ce liquide, d'une cible plane telle qu'une plaquette, ledit dispositif comprenant une première fente et une seconde fente agencées à proximité immédiate de la cible, un espace étant présent entre la cible et le dispositif de séchage, la première fente étant incluse pour amener dans ledit espace du gaz sous pression dirigé vers la cible, la seconde fente étant incluse pour évacuer ledit liquide à distance de la cible au moyen dudit gaz.
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