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1. (WO2014208957) CHEMICAL VAPOR DEPOSITION REACTOR AND METHOD FOR PREPARING POLYSILICON
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/208957    International Application No.:    PCT/KR2014/005525
Publication Date: 31.12.2014 International Filing Date: 23.06.2014
IPC:
C23C 16/44 (2006.01), C23C 16/22 (2006.01)
Applicants: HANWHA CHEMICAL CORPORATION [KR/KR]; 86, Cheonggyecheon-ro Jung-gu, Seoul 04541 (KR)
Inventors: PARK, Sung Eun; (KR).
HAN, Joo Hee; (KR).
PARK, Jea Sung; (KR)
Agent: YOU ME PATENT AND LAW FIRM; 115 Teheran-ro, Gangnam-gu, Seoul 135-912 (KR)
Priority Data:
10-2013-0073184 25.06.2013 KR
10-2014-0049390 24.04.2014 KR
Title (EN) CHEMICAL VAPOR DEPOSITION REACTOR AND METHOD FOR PREPARING POLYSILICON
(FR) RÉACTEUR DE DÉPÔT CHIMIQUE EN PHASE VAPEUR ET PROCÉDÉ DE PRÉPARATION DE POLYSILICIUM
Abstract: front page image
(EN)Disclosed are a chemical vapor deposition (CVD) reactor and a method for preparing polysilicon. Designed to perform a CVD process in a continuous manner, the CVD reactor and the preparation method of polysilicon allow for the mass production of polysilicon.
(FR)Cette invention concerne un réacteur de dépôt chimique en phase vapeur (CVD) et un procédé de préparation de polysilicium. Conçus pour mettre en oeuvre un procédé de CVD en continu, le réacteur CVD et le procédé de préparation de polysilicium selon l'invention permettent la production en masse de polysilicium.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)