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1. (WO2014208487) INKJET DISCHARGE METHOD, PATTERN FORMATION METHOD, AND PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/208487 International Application No.: PCT/JP2014/066520
Publication Date: 31.12.2014 International Filing Date: 23.06.2014
IPC:
B05D 1/26 (2006.01) ,B05D 7/24 (2006.01) ,B41M 5/00 (2006.01) ,C08K 5/00 (2006.01) ,C08L 71/00 (2006.01) ,C09D 11/00 (2014.01)
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Processes for applying liquids or other fluent materials
26
performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
7
Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
24
for applying particular liquids or other fluent materials
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
M
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
5
Duplicating or marking methods; Sheet materials for use therein
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5
Use of organic ingredients
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
71
Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
11
Inks
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
後藤 雄一郎 GOTO Yuichiro; JP
大松 禎 OOMATSU Tadashi; JP
北川 浩隆 KITAGAWA Hirotaka; JP
榎本 雄一郎 ENOMOTO Yuichiro; JP
児玉 憲一 KODAMA Kenichi; JP
Agent:
特許業務法人特許事務所サイクス SIKS & CO.; 東京都中央区京橋一丁目8番7号 京橋日殖ビル8階 8th Floor, Kyobashi-Nisshoku Bldg., 8-7, Kyobashi 1-chome, Chuo-ku, Tokyo 1040031, JP
Priority Data:
2013-13440127.06.2013JP
Title (EN) INKJET DISCHARGE METHOD, PATTERN FORMATION METHOD, AND PATTERN
(FR) PROCÉDÉ DE REJET DE JET D'ENCRE, PROCÉDÉ DE FORMATION DE MOTIF ET MOTIF
(JA) インクジェット吐出方法、パターン形成方法、および、パターン
Abstract:
(EN) Provided is a discharge method that allows suitable discharge, has excellent mold release properties in terms of the pattern obtained using this discharge method, and produces a good pattern, even when a head for very small discharges of 6 pL or less required for controlling (reducing film thickness, increasing uniformity) a remaining film is used. An inkjet discharge method that includes discharging a photo-curable composition that satisfies (a) to (c) in a droplet size of 6 pL or less, the photo-curable composition (a) containing a fluorine-containing material in a ratio of 4 mass% or more of the composition, (b) the surface tension of the composition being 25 to 35 mN/m, and (c) the content of the solvent with a boiling point of 200°C or less being 5 mass% or less of the composition.
(FR) L'invention porte sur un procédé de rejet de jet d'encre qui permet un rejet approprié, qui possède d'excellentes propriétés de démoulage en ce qui concerne le motif obtenu à l'aide de ce procédé de rejet et qui produit un bon motif, même lorsqu'une tête pour de très petites rejets, inférieures ou égales à 6 pL requises pour réguler un film restant (réduire l'épaisseur du film, augmenter l'uniformité) est utilisée. Le procédé de rejet de jet d'encre selon l'invention comprend le rejet d'une composition photodurcissable qui satisfait aux conditions (a) à (c) en ce qui concerne la taille des gouttelettes, cette dernière étant inférieure ou égale à 6 pL, (a) la composition photodurcissable contenant une substance contenant du fluor en une proportion supérieure ou égale à 4 % en masse de la composition, (b) la tension superficielle de la composition étant de 25 à 35 mN/m et (c) la teneur d'un solvant ayant un point d'ébullition inférieur ou égal à 200 °C est inférieure ou égale à 5 % en masse de la composition.
(JA) 残膜の制御(薄膜化、均一化)に必要な6pL以下の微滴吐出用ヘッドを使用した場合でも、適切に吐出可能で、この吐出方法を用いて得られたパターンが離型性に優れ、かつ、そのパターンが良好となる吐出方法の提供。下記(a)~(c)を満たす光硬化性組成物を6pL以下の液滴サイズで吐出することを含む、インクジェット吐出方法;(a)含フッ素材料を、上記組成物の4質量%以上の割合で含有する;(b)上記組成物の表面張力が、25~35mN/mである;(c)沸点が200℃以下の溶剤の含有量が上記組成物の5質量%以下である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)