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1. (WO2014208362) APPLICATOR DEVICE AND HEIGHT DETECTION METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/208362 International Application No.: PCT/JP2014/065711
Publication Date: 31.12.2014 International Filing Date: 13.06.2014
IPC:
G01B 11/02 (2006.01) ,B05C 11/00 (2006.01) ,B05D 3/00 (2006.01) ,G01B 9/02 (2006.01) ,G02B 5/20 (2006.01) ,G02F 1/13 (2006.01)
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
02
for measuring length, width, or thickness
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
11
Component parts, details or accessories not specifically provided for in groups B05C1/-B05C9/132
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
3
Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9
Instruments as specified in the subgroups and characterised by the use of optical measuring means
02
Interferometers
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
Applicants: OHBA, Hiroaki[JP/JP]; JP (US)
NTN CORPORATION[JP/JP]; 3-17, Kyomachibori 1-chome, Nishi-ku, Osaka-shi, Osaka 5500003, JP (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW)
Inventors: OHBA, Hiroaki; JP
Agent: FUKAMI PATENT OFFICE, P.C.; Nakanoshima Central Tower, 2-7, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka 5300005, JP
Priority Data:
2013-13250625.06.2013JP
Title (EN) APPLICATOR DEVICE AND HEIGHT DETECTION METHOD
(FR) DISPOSITIF D'APPLICATEUR ET PROCÉDÉ DE DÉTECTION DE HAUTEUR
(JA) 塗布装置および高さ検出方法
Abstract:
(EN) A controlling computer (11) of this defect repair device (1) (applicator device) positions an objective lens (16) above an ink application part comprising ink applied to the surface of a substrate (7), then captures an image while moving a Z stage (8), calculates, for each of a plurality of pixels constituting the captured image, a Z stage position (focal location of the pixel) at which a contrast value C reaches a peak, and on the basis of the calculated Z stage position, calculates the height of the ink application part. Thus, the height of the ink application part can be detected quantitatively.
(FR) Un ordinateur (11) de commande du dispositif (1) de réparation de défaut (dispositif d'applicateur) selon la présente invention positionne un objectif (16) au-dessus d'une partie d'application d'encre comprenant de l'encre appliquée à la surface d'un substrat (7), puis capture une image tout en déplaçant un étage (8) Z, calcule, pour chacun d'une pluralité de pixels constituant l'image capturée, une position d'étage Z (emplacement focal du pixel) au niveau de laquelle une valeur de contraste C atteint un pic, et sur la base de la position d'étage Z calculée, calcule la hauteur de la partie d'application d'encre. Ainsi, la hauteur de la partie d'application d'encre peut être détectée de manière quantitative.
(JA) この欠陥修正装置(1)(塗布装置)の制御用コンピュータ(11)は、基板(7)の表面に塗布されたインクからなるインク塗布部の上方に対物レンズ(16)を位置決めした後、Zステージ(8)を移動させながら画像を撮像し、撮像した画像を構成する複数の画素の各々についてコントラスト値CがピークとなるZステージ位置(当該画素の焦点位置)を求め、求めたZステージ位置に基づいてインク塗布部の高さを求める。したがって、インク塗布部の高さを定量的に検出できる。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)