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1. (WO2014208270) METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR INFORMATION-RECORDING MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/208270 International Application No.: PCT/JP2014/064380
Publication Date: 31.12.2014 International Filing Date: 30.05.2014
IPC:
B24B 37/015 (2012.01) ,B24B 1/00 (2006.01) ,B24B 7/24 (2006.01) ,B24B 37/08 (2012.01) ,B24B 37/24 (2012.01) ,G11B 5/84 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
005
Control means for lapping machines or devices
015
Temperature control
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
1
Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
7
Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
20
characterised by a special design with respect to properties of the material of non-metallic articles to be ground
22
for grinding inorganic material, e.g. stone, ceramics, porcelain
24
for grinding or polishing glass
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
04
designed for working plane surfaces
07
characterised by the movement of the work or lapping tool
08
for double side lapping
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
11
Lapping tools
20
Lapping pads for working plane surfaces
24
characterised by the composition or properties of the pad materials
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
Applicants:
HOYA株式会社 HOYA CORPORATION [JP/JP]; 東京都新宿区中落合2丁目7番5号 7-5, Naka-Ochiai 2-chome, Shinjuku-ku Tokyo 1618525, JP
Inventors:
坂本 明広 SAKAMOTO Akihiro; JP
塚田 和也 TSUKADA Kazuya; JP
Agent:
田村 敬二郎 TAMURA Keijiro; 東京都新宿区西新宿七丁目4番3号 升本ビル8階 8th Floor, Masumoto Bldg., 4-3, Nishi-Shinjuku 7-chome, Shinjuku-ku, Tokyo 1600023, JP
Priority Data:
2013-13579928.06.2013JP
Title (EN) METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR INFORMATION-RECORDING MEDIUM
(FR) PROCÉDÉ DE FABRICATION DE SUBSTRAT EN VERRE POUR SUPPORT D'ENREGISTREMENT D'INFORMATIONS
(JA) 情報記録媒体用ガラス基板の製造方法
Abstract:
(EN) Provided is a method for manufacturing glass substrates for information-recording media with which variation in the shape of the glass substrates within a single carrier can be limited by performing strict temperature control of the surface plate. The polishing process is performed so that during the polishing process, (T1)(°C), which is the mean of the polishing pad temperatures near the sun gear and near the internal gear of the polishing surface plate, and the temperature (T2)(°C) of the polishing pads at the centers of the carriers of the polishing surface plate satisfy formula (1). |(T1)-(T2)|≤ 3°C (1)
(FR) La présente invention concerne un procédé de fabrication de substrats en verre pour supports d'enregistrement d'informations grâce auquel la variation de la forme des substrats en verre dans un seul support peut être limitée par l'exécution d'une stricte régulation de la température de la plaque de surface. Le processus de polissage est exécuté de sorte que, pendant le processus de polissage, (T1)(°C), qui est la moyenne des températures de tampon à polir près du planétaire et près de l'engrenage interne de la plaque de surface de polissage, et la température (T2)(°C) des tampons à polir aux centres des supports de la plaque de surface de polissage, satisfassent à la formule (1). |(T1)-(T2)|≤ 3°C (1)
(JA)  定盤の温度管理を厳密に行うことで、1つのキャリア内におけるガラス基板の形状バラツキを抑えることができる情報記録媒体用ガラス基板を製造する製造方法を提供する。 研磨工程において、研磨定盤のサンギアの近傍部及びインターナルギアの近傍部における研磨パッドの温度の平均値であるT1(℃)と、研磨定盤のキャリアの中央部における研磨パッドの温度T2(℃)が、下記式(1)を満たすように研磨工程を行う。 │T1-T2│≦3℃ (1)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)