Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2014207885) SILICON OLIGOMER AND PRODUCTION METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/207885 International Application No.: PCT/JP2013/067778
Publication Date: 31.12.2014 International Filing Date: 28.06.2013
IPC:
C07F 7/04 (2006.01) ,C08G 77/02 (2006.01) ,C09D 183/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
04
Esters of silicic acids
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
77
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
02
Polysilicates
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
183
Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
Applicants:
株式会社JCU JCU CORPORATION [JP/JP]; 東京都台東区東上野4丁目8番1号 TIXTOWER UENO 16階 TIXTOWER UENO 16th floor, 8-1, Higashiueno 4-chome, Taito-ku, Tokyo 1100015, JP
Inventors:
佐土原 大祐 SADOHARA Daisuke; JP
西川 賢一 NISHIKAWA Kenichi; JP
根道 靖丈 NEMICHI Yasutake; JP
戸田 久之 TODA Hisayuki; JP
安田 弘樹 YASUDA Hiroki; JP
都木 新介 TAKAGI Shinsuke; JP
コルドニエ クリストファー アネスト ジョン CORDONIER Christopher Ernest John; JP
Agent:
特許業務法人 小野国際特許事務所 THE PATENT CORPORATE BODY OF ONO & CO.; 東京都千代田区神田和泉町1-13-1水戸部ビル4階 Mitobe Bldg. 4F., 1-13-1, Kandaizumi-cho, Chiyoda-ku, Tokyo 1010024, JP
Priority Data:
Title (EN) SILICON OLIGOMER AND PRODUCTION METHOD THEREFOR
(FR) OLIGOMÈRE DE SILICIUM ET PROCÉDÉ DE PRODUCTION CORRESPONDANT
(JA) シリコンオリゴマーおよびその製造方法
Abstract:
(EN) The purpose of the present invention is to provide a silicon oligomer having a novel function that conventional condensates of water and tetra-alkoxysilane do not have. Provided are: a silicon oligomer that is represented by formula (I) (wherein each of R1-R10 independently represents an alkyl group or a hydroxyalkyl group having 1-4 carbon atoms, each of X1-X3 independently represents a group that is represented by formula (II) [wherein A is an alkylene group that has 2-4 carbon atoms and that may be branched and l is an integer of 1-3], n is 0 or 1, m is an integer of 1-3 when n is 0, and m is 1 when n is 1); and a production method therefor.
(FR) La présente invention concerne un oligomère de silicium présentant une nouvelle fonction que les condensats classiques d'eau et de tétraalcoxysilane ne présentent pas. L'invention concerne : un oligomère de silicium qui est représenté par la formule (I) (dans laquelle chacun parmi R1-R10 représente, indépendamment, un groupe alkyle ou un groupe hydroxyalkyle comprenant 1-4 atomes de carbone, chacun parmi X1-X3 représente, indépendamment, un groupe qui est représenté par la formule (II) [dans laquelle A représente un groupe alkylène qui comprend 2-4 atomes de carbone et qui peut être ramifié et l est un entier de 1-3], n vaut 0 ou 1, m est un entier de 1-3 lorsque n vaut 0, et m vaut 1 lorsque n vaut 1) ; et un procédé de production correspondant.
(JA)  従来の水とテトラアルコキシシランの縮合物にはない、新規な機能を有するシリコンオリゴマーを提供することを目的とし、次の一般式(I)(ただし、R~R10はそれぞれ独立して炭素数1~4のアルキル基またはヒドロキシアルキル基であり、X~Xはそれぞれ独立して次の一般式(II)(ただし、Aは炭素数2~4の分岐していてもよいアルキレン基であり、lは1~3の整数である)で表される基であり、nは0または1であり、mはnが0のときは1~3の整数であり、nが1のときは1である)で表されるシリコンオリゴマーおよびその製造方法を提供する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)