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1. (WO2014206706) RADIATION SOURCE FOR AN EUV OPTICAL LITHOGRAPHIC APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A RADIATION SOURCE

Pub. No.:    WO/2014/206706    International Application No.:    PCT/EP2014/061710
Publication Date: Thu Jan 01 00:59:59 CET 2015 International Filing Date: Fri Jun 06 01:59:59 CEST 2014
IPC: G03F 7/20
H05G 2/00
Applicants: ASML NETHERLANDS B.V.
Inventors: FRANKEN, Johannes
Title: RADIATION SOURCE FOR AN EUV OPTICAL LITHOGRAPHIC APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A RADIATION SOURCE
Abstract:
A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.