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1. (WO2014206117) METHOD AND DEVICE FOR REDUCING CONTACT RESISTANCE OF TWO-DIMENSIONAL CRYSTALLINE MATERIAL

Pub. No.:    WO/2014/206117    International Application No.:    PCT/CN2014/073586
Publication Date: Thu Jan 01 00:59:59 CET 2015 International Filing Date: Wed Mar 19 00:59:59 CET 2014
IPC: H01L 21/02
H01L 21/027
Applicants: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
中国科学院微电子研究所
Inventors: JIA, Kunpeng
贾昆鹏
SU, Yajuan
粟雅娟
ZHU, Huilong
朱慧珑
ZHAO, Chao
赵超
Title: METHOD AND DEVICE FOR REDUCING CONTACT RESISTANCE OF TWO-DIMENSIONAL CRYSTALLINE MATERIAL
Abstract:
Provided are a method and device for reducing the contact resistance of a two-dimensional crystalline material. An example method can comprise: forming a contact material layer on a two-dimensional crystalline material layer; performing ion implantation; and performing thermal annealing.