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1. (WO2014206035) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, DISPLAY PANEL AND DISPLAY DEVICE

Pub. No.:    WO/2014/206035    International Application No.:    PCT/CN2013/089530
Publication Date: Thu Jan 01 00:59:59 CET 2015 International Filing Date: Tue Dec 17 00:59:59 CET 2013
IPC: H01L 21/77
H01L 27/12
H01L 29/786
H01L 21/84
Applicants: BOE TECHNOLOGY GROUP CO., LTD.
京东方科技集团股份有限公司
Inventors: CHENG, Jun
成军
CHEN, Haijing
陈海晶
JIANG, Chunsheng
姜春生
Title: ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, DISPLAY PANEL AND DISPLAY DEVICE
Abstract:
Provided are an array substrate and a manufacturing method therefor, a display panel and a display device. The array substrate comprises a plurality of pixel units. Each pixel unit comprises a thin-film transistor area (Q1) and a display area (Q2), wherein a thin-film transistor is arranged in the thin-film transistor area (Q1), and the thin-film transistor comprises: a gate electrode (2), a gate insulating layer (3), a source electrode (601), a drain electrode (602) and an active area (401); and a pixel electrode (8) is provided in the display area (Q2). The manufacturing method for an array substrate comprises: forming a pattern which comprises a gate electrode (2) on a substrate (1) by means of a patterning process, and forming a gate insulating layer (3); on the substrate (1), on which the above step is completed, forming a pattern which comprises the active area (401) and an etching blocking area (5) provided on the active area (401) by means of the patterning process; forming a transparent conducting-layer thin film, and forming a pattern which comprises a source electrode (601) and a drain electrode (602) using the transparent conducting-layer thin film by means of the patterning process; and forming a pattern which comprises a pixel electrode (8) using the transparent conducting-layer thin film by means of the patterning process.