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1. (WO2014204142) RADICAL-CURABLE ADHESIVE COMPOSITION AND POLARIZING PLATE COMPRISING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/204142 International Application No.: PCT/KR2014/005230
Publication Date: 24.12.2014 International Filing Date: 13.06.2014
IPC:
C09J 11/06 (2006.01) ,C09J 4/00 (2006.01) ,G02B 5/30 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
11
Features of adhesives not provided for in group C09J9/76
02
Non-macromolecular additives
06
organic
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
4
Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
Applicants:
주식회사 엘지화학 LG CHEM, LTD. [KR/KR]; 서울시 영등포구 여의대로 128 128, Yeoui-daero Yeongdeungpo-gu Seoul 150-721, KR
Inventors:
박광승 PARK, Kwang-Seung; KR
이미린 LEE, Mi-Rin; KR
서은미 SEO, Eun-Mi; KR
허은수 HUH, Eun-Soo; KR
조용일 CHO, Yong-Il; KR
Agent:
정순성 CHUNG, Soon-Sung; 서울시 강남구 테헤란로 19길 5, 삼보빌딩 6층 새온특허법률사무소 Saeon Patent & Law Firm 6F, Sambo Bldg. 5, Teheran-ro 19-gil, Gangnam-gu Seoul 135-911, KR
Priority Data:
10-2013-006963018.06.2013KR
10-2014-006760203.06.2014KR
Title (EN) RADICAL-CURABLE ADHESIVE COMPOSITION AND POLARIZING PLATE COMPRISING SAME
(FR) COMPOSITION ADHÉSIVE DURCISSABLE PAR VOIE RADICALAIRE ET PLAQUE POLARISANTE COMPRENANT LADITE COMPOSITION
(KO) 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판
Abstract:
(EN) The present invention relates to a radical-curable adhesive composition comprising, with respect to 100 parts by weight of the radical-curable adhesive composition: 40 parts by weight to 80 parts by weight of a first compound represented by [Formula 1]; 15 parts by weight to 50 parts by weight of a second compound comprising at least one carboxy group; and 0.5 parts by weight to 10 parts by weight of a radical initiator, and a polarizing plate comprising the same.
(FR) La présente invention concerne une composition adhésive durcissable par voie radicalaire comprenant, pour 100 parts en masse de la composition adhésive durcissable par voie radicalaire : 40 parts en masse à 80 parts en masse d'un premier composé répondant à la [Formule 1] ; 15 parts en masse à 50 parts en masse d'un deuxième composé comprenant au moins un groupement carboxy ; et 0,5 part en masse à 10 parts en masse d'un initiateur radicalaire, et une plaque polarisante comprenant ladite composition.
(KO) 본 발명은 라디칼 경화형 접착제 조성물 100 중량부에 대하여, [화학식 1]로 표시되는 제1화합물 40 중량부 내지 80 중량부; 적어도 하나 이상의 카르복시기를 포함하는 제2화합물 15 중량부 내지 50 중량부; 및 라디칼 개시제 0.5 중량부 내지 10 중량부를 포함하는 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)