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1. (WO2014203801) RESIN COMPOSITION FOR PATTERN FORMATION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/203801 International Application No.: PCT/JP2014/065602
Publication Date: 24.12.2014 International Filing Date: 12.06.2014
IPC:
C08L 63/00 (2006.01) ,C08G 59/02 (2006.01) ,C08L 23/00 (2006.01) ,C08L 25/04 (2006.01) ,C08L 33/10 (2006.01) ,C08L 55/02 (2006.01) ,C08L 57/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
63
Compositions of epoxy resins; Compositions of derivatives of epoxy resins
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
59
Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compounds; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
02
Polycondensates containing more than one epoxy group per molecule
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
23
Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
25
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
02
Homopolymers or copolymers of hydrocarbons
04
Homopolymers or copolymers of styrene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04
Homopolymers or copolymers of esters
06
of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
10
Homopolymers or copolymers of methacrylic acid esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
55
Compositions of homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C08L23/-C08L53/211
02
ABS [Acrylonitrile-Butadiene-Styrene] polymers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
57
Compositions of unspecified polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
Applicants: OK-KASEI. CO., LTD.[JP/JP]; 11-21, Morinomiya-chuo 2-chome, Chuo-ku, Osaka-shi, Osaka 5400043, JP
Inventors: MATSUMURA,Kazuhiro; JP
ONO,Hiroki; JP
TANIGUCHI,Kazushi; JP
NAKASUKA,Toshikazu; JP
INUI,Yuji; JP
Agent: UNIUS PATENT ATTORNEYS OFFICE; SHIN-OSAKA MT Bldg. 1, 13-9, Nishinakajima 5-chome, Yodogawa-ku, Osaka-shi, Osaka 5320011, JP
Priority Data:
2013-12682217.06.2013JP
Title (EN) RESIN COMPOSITION FOR PATTERN FORMATION
(FR) COMPOSITION DE RÉSINE POUR FORMATION DE MOTIF
(JA) 模様形成用樹脂組成物
Abstract:
(EN) The present invention addresses the problem of providing a resin composition for pattern formation that makes it possible to produce a molded resin body having a long flow pattern that resembles the strokes of a sumi-e painting or a flow pattern that resembles marble by mixing the resin composition with a thermoplastic resin and molding the result. Provided is a resin composition for pattern formation that contains at least one coloring component that is selected from the group consisting of: reaction products of thermoplastic polyester resins and epoxy group-containing polymers; dyes; and pigments. The epoxy group-containing polymer preferably comprises glycidyl (meth)acrylate as a monomer unit, and it is preferable that the epoxy equivalent weight thereof be 150-7000.
(FR) L'invention a pour objectif de fournir une composition de résine pour formation de motif qui permet de fabriquer un corps moulé en résine qui possède un motif à veinages épais tel que ceux d'un dessin à l'encre ou un motif à veinages imitant le marbre par mélange et moulage avec une résine thermoplastique. Cette composition de résine pour formation de motif comprend : un produit de réaction d'une résine polyester thermoplastique et d'un polymère comprenant un groupe époxy ; et au moins une sorte de composant colorant choisi dans un groupe constitué de teinture et pigment. De préférence, le polymère comprenant un groupe époxy comprend un (méth)acrylate de glycidyle, en tant qu'unité monomère, et son équivalent époxy est compris entre 150 et 7000.
(JA)  熱可塑性樹脂と混合し、成形することにより、墨絵のような毛足の長い流れ模様や大理石調の流れ模様を有する樹脂成形体を製造可能とする模様形成用樹脂組成物を提供することを課題とし、熱可塑性ポリエステル樹脂とエポキシ基含有重合体との反応生成物、ならびに染料および顔料からなる群より選択された少なくとも一種の着色成分を含有する模様形成用樹脂組成物。エポキシ基含有重合体は、モノマー単位として、グリシジル(メタ)アクリレートを含有することが好ましく、そのエポキシ当量は150~7000であることが好ましい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)