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1. (WO2014202517) METHOD AND DEVICE FOR DETERMINING A REFERENCE POINT OF AN ORIENTATION MARKING ON A SUBSTRATE OF A PHOTOLITHOGRAPHIC MASK IN AN AUTOMATED MANNER

Pub. No.:    WO/2014/202517    International Application No.:    PCT/EP2014/062533
Publication Date: Thu Dec 25 00:59:59 CET 2014 International Filing Date: Tue Jun 17 01:59:59 CEST 2014
IPC: G03F 9/00
G01B 11/00
Applicants: CARL ZEISS SMT GMBH
Inventors: BUDACH, Michael
SCHÖNBERGER, Ralf
JÖST, Michael
Title: METHOD AND DEVICE FOR DETERMINING A REFERENCE POINT OF AN ORIENTATION MARKING ON A SUBSTRATE OF A PHOTOLITHOGRAPHIC MASK IN AN AUTOMATED MANNER
Abstract:
The invention relates to a method for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner, comprising the following steps: (a) performing a first line scan within a start region of the substrate in a first direction on a surface of the substrate, wherein the orientation marking is arranged within the start region, in order to find a first element of the orientation marking; (b) performing a second line scan within the start region in at least one second direction on the surface of the substrate, which at least one second direction intersects with the first direction, in order to find a second element of the orientation marking; (c) estimating the reference point of the orientation marking from the found first element and the found second element of the orientation marking; and (d) imaging a target region around the estimated reference point of the orientation marking in order to determine the reference of the orientation marking, wherein the imaging is performed with a higher resolution than the performance of the line scans in steps (a) and (b).