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|1. (WO2014201777) VACUUM DRYING APPARATUS, VACUUM DRYING METHOD, AND PHOTOETCHING METHOD|
|Applicants:||BOE TECHNOLOGY GROUP CO., LTD.
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
|Title:||VACUUM DRYING APPARATUS, VACUUM DRYING METHOD, AND PHOTOETCHING METHOD|
A vacuum drying apparatus comprises a vacuum chamber provided with an exhaust vent and a chamber door, a vacuum pumping apparatus in communication with the exhaust vent, and a heating assembly disposed in the vacuum chamber. A vacuum drying method by using the vacuum drying apparatus comprises: when vacuum drying is performed on a substrate coated with a photoresist, simultaneously performing the heating and vacuum drying on the photoresist, the vacuum degree preferably ranging from 26Pa to 500Pa during the drying, and the heating temperature preferably ranging from 30 to 90 degrees centigrade, so as to produce less hardening films, thereby reducing the residual amount of a solvent in the photoresist, and improving the photolithographic accuracy.