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1. (WO2014201777) VACUUM DRYING APPARATUS, VACUUM DRYING METHOD, AND PHOTOETCHING METHOD

Pub. No.:    WO/2014/201777    International Application No.:    PCT/CN2013/083907
Publication Date: Thu Dec 25 00:59:59 CET 2014 International Filing Date: Mon Sep 23 01:59:59 CEST 2013
IPC: F26B 9/06
G03F 7/16
F26B 7/00
Applicants: BOE TECHNOLOGY GROUP CO., LTD.
京东方科技集团股份有限公司
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
成都京东方光电科技有限公司
Inventors: LU, Zhong
陆忠
WANG, Juncai
王军才
CHEN, Wei
陈巍
LI, Bingtian
李炳天
HUANG, Lijuan
黄丽娟
Title: VACUUM DRYING APPARATUS, VACUUM DRYING METHOD, AND PHOTOETCHING METHOD
Abstract:
A vacuum drying apparatus comprises a vacuum chamber provided with an exhaust vent and a chamber door, a vacuum pumping apparatus in communication with the exhaust vent, and a heating assembly disposed in the vacuum chamber. A vacuum drying method by using the vacuum drying apparatus comprises: when vacuum drying is performed on a substrate coated with a photoresist, simultaneously performing the heating and vacuum drying on the photoresist, the vacuum degree preferably ranging from 26Pa to 500Pa during the drying, and the heating temperature preferably ranging from 30 to 90 degrees centigrade, so as to produce less hardening films, thereby reducing the residual amount of a solvent in the photoresist, and improving the photolithographic accuracy.