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1. (WO2014200288) METAL NANOPLATE, METHOD FOR MANUFACTURING SAME, AND CONDUCTIVE INK COMPOSITION AND CONDUCTIVE FILM COMPRISING METAL NANOPLATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/200288    International Application No.:    PCT/KR2014/005174
Publication Date: 18.12.2014 International Filing Date: 12.06.2014
IPC:
B22F 9/24 (2006.01), B22F 1/00 (2006.01)
Applicants: LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu Seoul 07336 (KR)
Inventors: KWON, Won Jong; (KR).
PARK, Se-Ho; (KR).
YOON, Sung-Ho; (KR).
JEON, Yeo-Jin; (KR)
Agent: YOU ME PATENT AND LAW FIRM; 115 Teheran-ro, Gangnam-gu Seoul 135-912 (KR)
Priority Data:
10-2013-0068433 14.06.2013 KR
Title (EN) METAL NANOPLATE, METHOD FOR MANUFACTURING SAME, AND CONDUCTIVE INK COMPOSITION AND CONDUCTIVE FILM COMPRISING METAL NANOPLATE
(FR) NANOPLAQUE MÉTALLIQUE, SON PROCÉDÉ DE FABRICATION ET COMPOSITION D'ENCRE CONDUCTRICE ET FILM CONDUCTEUR LA COMPRENANT
(KO) 금속 나노플레이트, 이의 제조 방법, 이를 포함하는 도전성 잉크 조성물 및 전도성 필름
Abstract: front page image
(EN)The present invention relates to a metal nanoplate, a method for manufacturing same, and a conductive ink composition and a conductive film comprising metal nanoplate. The metal nanoplate does not require application of a high temperature and high pressure and thus can be easily manufactured at a low temperature and at normal pressure, and a conductive film or a conductive pattern, among others, having excellent conductivity can be formed even when the conductive ink composition comprising the metal nanoplate is printed on a substrate and then heat-treated or dried at a low temperature. As a result, the metal nanoplate and the conductive ink composition comprising same can be very appropriately applied to various semiconductor elements, display devices, or when forming a conductive pattern or a conductive film for a solar cell in an environment requiring low-temperature firing.
(FR)La présente invention porte sur une nanoplaque métallique, sur son procédé de fabrication et sur une composition d'encre conductrice et un film conducteur comprenant une nanoplaque métallique. La nanoplaque métallique ne nécessite pas l'application d'une haute température et d'une haute pression et donc peut être facilement fabriquée à une basse température et à une pression normale et un film conducteur ou un motif conducteur, entre autres, ayant une excellente conductivité peuvent être formés même lorsque la composition d'encre conductrice comprenant la nanoplaque métallique est imprimée sur un substrat et ensuite traitée thermiquement ou séchée à une basse température. En conséquence, la nanoplaque métallique et la composition d'encre conductrice la comprenant peuvent être de façon tout à fait appropriée appliquées à divers éléments à semi-conducteur ou dispositifs d'affichage ou lors de la formation d'un motif conducteur ou d'un film conducteur pour une cellule solaire dans un environnement nécessitant une cuisson à basse température.
(KO)본 발명은 금속 나노플레이트, 이의 제조 방법, 이를 포함하는 도전성 잉크 조성물 및 전도성 필름에 관한 것이다. 상기 금속 나노플레이트는 고온 및 고압을 적용할 필요 없이 저온 및 상압에서 용이하게 제조 가능할 뿐 아니라, 이를 포함하는 도전성 잉크 조성물을 기판 상에 인쇄한 후에 낮은 온도에서 열처리 또는 건조 공정을 진행하더라도 우수한 도전성을 나타내는 도전막 또는 도전성 패턴 등을 형성할 수 있다. 따라서, 상기 금속 나노플레이트 및 이를 포함하는 도전성 잉크 조성물은 저온 소성이 요구되는 환경 하에서 각종 반도체 소자, 표시 장치 또는 태양 전지의 도전성 패턴 또는 도전막 등을 형성하는데 매우 적합하게 적용될 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)