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Machine translation
1. (WO2014200219) DIELECTRIC BARRIER DISCHARGE REACTING APPARATUS FOR PRODUCING DISILANE, TRISILANE, AND TETRASILANE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/200219    International Application No.:    PCT/KR2014/004908
Publication Date: 18.12.2014 International Filing Date: 03.06.2014
IPC:
C01B 33/021 (2006.01), C01B 33/04 (2006.01), B01J 19/12 (2006.01)
Applicants: YUICHI, Iikubo [US/US]; (US).
JANG, Hyang-Ja [KR/KR]; (KR)
Inventors: YUICHI, Iikubo; (US).
JANG, Hyang-Ja; (KR)
Agent: JIN, Yong-Suk; (Dunsan-dong) #513 Cheongsa officetel 228 Cheongsa-ro Seo-gu, Daejeon 302-828 (KR)
Priority Data:
10-2013-0066750 11.06.2013 KR
Title (EN) DIELECTRIC BARRIER DISCHARGE REACTING APPARATUS FOR PRODUCING DISILANE, TRISILANE, AND TETRASILANE
(FR) APPAREIL DE RÉACTION PAR DÉCHARGE À BARRIÈRE DIÉLECTRIQUE POUR LA PRODUCTION DE DISILANE, DE TRISILANE, ET DE TÉTRASILANE
(KO) 디실란과 트리실란과 테트라실란의 제조를 위한 유전체 장벽 방전 반응장치
Abstract: front page image
(EN)The present invention relates to a dielectric barrier discharge reacting apparatus for producing disilane, trisilane, and tetrasilane and, more specifically, to a dielectric barrier discharge reacting apparatus for producing disilane, trisilane, and tetrasilane, which is capable of producing not only disilane but also trisilane and tetrasilane from silane in a continuous process, and which comprises therein: a discharge electrode rod connected to a high-frequency apparatus; and a porous tube surrounding the outside of the discharge electrode rod, the reacting apparatus having a high yield as well as being capable of continuously producing disilane, trisilane, and tetrasilane from silane by adjusting the material of the discharge electrode rod, the distance between the discharge electrode rod and porous tube, and the like.
(FR)La présente invention concerne un appareil de réaction par décharge à barrière diélectrique pour la production de disilane, de trisilane, et de tétrasilane et, plus spécifiquement, un appareil de réaction par décharge à barrière diélectrique pour la production de disilane, de trisilane, et de tétrasilane, qui est apte à produire non seulement du disilane mais également du trisilane et du tétrasilane à partir de silane en un processus continu, et qui comporte : une tige d'électrode de décharge reliée à un appareil à haute fréquence ; et un tube poreux entourant l'extérieur de la tige d'électrode de décharge, l'appareil de réaction présentant un rendement élevé tout en étant apte à produire de façon continue du disilane, du trisilane et du tétrasilane à partir de silane par un ajustement du matériau de la tige d'électrode de décharge, de la distance entre la tige d'électrode de décharge et le tube poreux, et autres.
(KO)본 발명은 디실란과 트리실란과 테트라실란의 제조를 위한 유전체 장벽 방전 반응장치에 관한 것으로서, 보다 상세하게는 실란에서 디실란뿐만 아니라 트리실란, 테트라실란을 연속 공정으로 제조할 수 있는 반응장치로, 반응장치 내부는 고주파 장치에 연결되어있는 방전 전극봉과, 이를 외부로 둘러싸고 있는 다공성 관재로 내부를 구성하며, 방전 전극봉의 재질, 방전 전극봉 및 다공성 관재의 간격 등을 조절하여, 실란에서 디실란, 트리실란, 테트라실란의 연속 제조가 가능하면서도 높은 수율을 가지는 디실란과 트리실란과 테트라실란의 제조를 위한 유전체 장벽 방전 반응장치에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)